CuInS2 thin films deposited by ALD

Chemical Vapor Deposition

Volumn 10, Issue 1, 2004, Pages 45-49

  Nanu, Marian ^a   Reijnen, Liesbeth ^a   Meester, Ben ^a   Schoonman, Joop ^a   Goossens, Albert ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DEPOSITION; FILM GROWTH; GLASS; MORPHOLOGY; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ATOMIC LAYER DEPOSITION; COPPER INDIUM SULFIDE;

COPPER COMPOUNDS;

EID: 1142281159     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306262     Document Type: Article

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