Low temperature metallorganic chemical vapor deposition routes to chromium metal thin films using bis(benzene)chromium

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3716-3723

  Maury, F ^a   Vahlas, C ^a   Abisset, S ^a   Gueroudji, L ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHROMIUM; HARDNESS; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; STEEL; THIN FILMS; VANADIUM;

BISBENZENE CHROMIUM;

METALLIC FILMS;

EID: 0033317723     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392539     Document Type: Article

References (46)

1. F. Maury, L. Gueroudji, and C. Vahlas, Surf. Coat. Technol, 86/87,316 (1996).
2. S. Hoshino, H. A. Laitinen, and G. B. Hoflund, J. Electrochem. Soc., 133, 681 (1986).
3. G. Cholvy, J. L. Derep, and M. Gantois, Thin Solid Films, 126,51 (1985).
4. K. Nakamura, K. Inagawa, K. Tsuraoka, and S. Komiya, Thin Solid Films, 40,155 (1977).
5. J.H. Hsieh, R. F. Hochman, Surf. Coalings Techno!., S4-5S, 315 (1992).
6. See, for example, R. Knoche, S. Audisio, and H. Mazille, in Chemical Vapor Deposition, 1981, J. M. Blocher, G. E. Vuillard, and G. Wahl, Editors, PV 81-7, p. 653, The Electrochemical Society Proceedings Series, Pennington, NJ (1981).
7. The Chemistry of Metals CVD, T. T. Kodas and M. Hampden-Smith, Editors, VCH Verlagsgesellschaft mbH, Weinheim (1994).
8. F. Maury, Adv. Mater, 3,542(1991).
9. G.S. Girolami and J. E. Gozum, Mater. Res. Soc. Symp. froc., 168,319 (1990).
10. F. Maury, Appl. Organometal. Chem., 6,619 (1992).
11. F. Maury, J. Phys. IV. coll. C5,5,449 (1995).
12. C. Vahlas, F. Maury, and L. Gueroudji, Chem. Vap. Déposition, 4,69 (1998).
13. L.M. Dyagileva, E. I. Tsyganova, and Yu. A. Aleksandrov, Zh. Obsh. Khim., 49, 2644(1979).
14. V.B. Polikarpov, A. S. Luzin, and V. A. Dodonov, Zh. Priklad. Khim., 57, 680 (1984).
15. V.B. Polikarpov, A. S. Luzin, V. A. Dodonov, and O. N. Naumova, Zh. Priklad. Khim.. 57,741(1984).
16. V.B. Polikarpov, A. S. Luzin, V. A. Dodonov, and E. K. Klement'ev, /z. Akad. Nauk SSSR, Neorganich. Mater., 20, 1839 (1984).
17. V.A. Umilin, A. D. Zorin, V. K. Kudryavtseva. M. Yu. Devyat'yarov, A. M. Kut'in, and V. N. Sakharova, Zh. Priklad. Khim., 62, 1226 (1989).
18. F. Maury, L. Gueroudji, C. Vahlas, S. Abisset, and L. Pelletier, in Chemical Vapor Deposition, Proeedings of the 14th International Conference and EUROCVD-11, M. D. Allendorf and C. Bernard, Editors, PV 97-25, p. 944, The Electrochemical Society Proceedings Series, Pennington, NJ (1997).
19. Gibbs Energy MINImizer (GEMINI 2), Thermodata, Grenoble, France (1994).
20. K.E. Spear and R. R. Dirkx, Mater. Res. Soc. Symp. Proc., 168, 19 (1990).
21. Scientific Group Thermodata Europe (SGTE), available on line from THERMODATA, BP 66, F-38402 Saint Martin d'Hères, France, and Royal Institute of Technology, S-10044 Stockholm, Sweden.
22. F. Maury, A. Mestari, and R. Morancho, Mater. Sei. Eng. A, 109, 69 (1989).
23. J.T. S. Andrews, E. F. Westrum, Jr., and N. Bjerrum, J. Organometal. Chem., 17, 293(1969).
24. G.G. Devyatykh. V. A. Umilin, and Yu. B. Zverev, Isrest. Akad. Nauk SSSR, Ser. Khim., 4,949(1969).
25. D.R. Stull, in Handbook of Chemistry and Physics, 66th ed., R. C. Weast, Editor, p. D-192, CRC Press, Boca Raton, FL (1986).
26. N.G. Anantha, V. Y. Doo, and D. K. Seto, J. Eleclrochem. Soc., 118, 163 (1971).
27. N. Maréchal, E. Quesnel, and Y. Pauleau, J. Mater. Res.. 9,1820 (1994).
28. A.Aubert,J. Danroc, A. Gaucher, and J. P. Terrât, Thin Solid Films, 126,61 (1985).
29. J.E. Sundgren and H. T. G. Hentzell, J. Vac. Sei. Technol. A, 4,2259 (1986).
30. B.D. Nash, T. T. Campbell, and F. E. Block, Rep. Invest., Bur. Mines, 7112 (April 1968).
31. L.M. Dyagileva, L. M..Pudeev, and Y. A. Aleksandrov, 2h. Obshch. Khim.. 43,446 (1973).
32. I.B. Johns, E. A. McEIhill, and J. O. Smith, J. Chem. Eng. Data, 7, 277 (1962).
33. A. Penner, A. Amirav, S. Tasaki, and R. Bersohn, J. Chem. Phys., 99,176 (1993).
34. R. Sahnoun and C. Mijoule, Submitted for publication.
35. F. Meyer, F. A. Khan, and P. B. Armentrout, J. Am. Chem. Soc., 117,9740 (1995).
36. G.A. Ozin and M. P. Andrews, Angew. Chem. Soc. Suppl., 381 (1982).
37. W.M. Lamanna, J. Am. Chem. Soc., 108,2096 (1986).
38. A.K. Bhattacharya, J. Chem. Soc.. Faraday Trans, l, 76,126 (1980).
39. V. Graves and J. J. Lagowski, Inorg. Chem., 15,577 (1976).
40. K. Schroeter, R. Wesendrup, and H. Schwarz, Ear. J. Org. Chem., 565 (1998).
41. C.M. Friend and E. L. Muetterties, J. Am. Chem. Soc., 103,773 (1981).
42. M. Stichler, R. Weimar, and D. Menzel, Surf. Sei., 384,179 (1997).
43. G. Kloster and K. Reisinger, J. Anal. Appl. Pyrolysis. 17,357 (1990).
44. B. Calaminus and G. Trouve, L. Delfosse, J. Anal. Appl. Pyrolysis. 27,281 (1993).
45. S. Abisset and F. Maury, Surf. Coatings Technol, 108-109,200 (1998).
46. G.G. Petukhov, O. N. Druzkhov, L. S. Zborovskaya, A. N. Artemov, T. K. Post nikova, and A. S. Emeryanova, J. Gen. Chem, USSR, 44, 2184 (1974).