Gaseous phase study of the Zr-organometallic ALD precursor TEMAZ by mass spectrometry

Journal of the Electrochemical Society

Volumn 156, Issue 1, 2009, Pages

  Monnier, D ^a,b   Nuta, I ^b   Chatillon, C ^b   Gros Jean, M ^a   Volpi, F ^b   Blanquet, E ^b  

^a STMICROELECTRONICS   (France)

^b UNIV GRENOBLE ALPES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ELECTROLYSIS; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HYDROCARBONS; IONIZATION; IONIZATION OF LIQUIDS; IONS; MASS SPECTROMETERS; MASS SPECTROMETRY; ORGANOMETALLICS; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SPECTROMETERS; SPECTROMETRY; VAPORIZATION;

ALD PRECURSORS; ATOMIC LAYER DEPOSITION (ALD; ETHYL GROUPS; GASEOUS PHASE; GASEOUS SPECIES; KNUDSEN CELLS; METHYL GROUPS; ORGANO-METALLIC; ROOM TEMPERATURES; TEMPERATURE RANGES; TETRAKIS; THERMAL STABILITIES;

ZIRCONIUM;

EID: 56749153704     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3009595     Document Type: Article

References (19)

1. M. Leskela and M. Ritala, Thin Solid Films, 409, 138 (2002).
2. D. M. Hausmann, E. Kim, J. Becker, and R. G. Gordon, Chem. Mater., 14, 4350 (2002).
3. J. Aarik, A. Aidla, H. Mandar, T. Uustare, and V. Sammelselg, Thin Solid Films, 408, 97 (2002).
4. C. M. Perkins, B. B. Triplett, P. C. McIntyre, K. C. Saraswat, S. Haukka, and M. Tuominen, Appl. Phys. Lett., 78, 2357 (2001).
5. R. Matero, A. Rahtu, M. Ritala, M. Leskelä, and T. Sajavaara, Thin Solid Films, 368, 1 (2000).
6. S. J. Yun, J. W. Lim, and J. H. Lee, Electrochem. Solid-State Lett., 7, F81 (2004).
7. S. K. Kim and C. S. Hwang, Electrochem. Solid-State Lett., 11 (3), G9 (2008).
8. P. Violet, L. Artaud, I. Nuta, C. Chatillon, and E. Blanquet, Rapid Commun. Mass Spectrom., Submitted.
9. P. Violet, I. Nuta, C. Chatillon, and E. Blanquet, Surf. Coat. Technol., 201, 8813 (2007).
10. C. Chatillon, M. Allibert, and A. Pattoret, " Thermodynamic and physico-chemical behavior of the interactions between Knudsen-effusion cells and the systems under investigation: analysis by high temperature mass spectrometry.," in Characterization of High Temperature Vapors and Gases, J. Hastie, Editor, p. 181, NBS Special publication 561/1, National Institute of Standards and Technology, Gaithersburg, MD, USA (1979).
11. E. D. Cater, " The effusion method at age 69: Current state of the art.," in Characterization of High Temperature Vapors and Gases, J. Hastie, Editor, p. 3, NBS Special publication 561/1, National Institute of Standards and Technology, Gaithersburg, MD, USA (1979).
12. P. Morland, C. Chatillon, and P. Rocabois, High Temp. Mater. Sci., 37, 167 (1997).
13. M. Heyrman, C. Chatillon, H. Collas, and J.-L. Chemin, Rapid Commun. Mass Spectrom., 18, 163 (2004).
14. J. Drowart, C. Chatillon, J. Hastie, and D. Bonnell, Pure Appl. Chem., 77, 683 (2005).
15. H. Hertz, Ann. Phys., 17, 177 (1882).
16. C. Chatillon, L. F. Malheiros, P. Rocabois, and M. Jeymond, High Temp.-High Press., 34, 213 (2002).
17. P. Clausing, J. Vac. Sci. Technol., 8, 636 (1971).
18. D. Santeler, J. Vac. Sci. Technol. A, 4, 338 (1986).
19. S. G. Lias, J. E. Bartmess, J. F. Liebman, J. L. Holmes, R. D. Levin, and W. G. Mallard, J. Phys. Chem. Ref. Data, 17, Supplement no. 1, 127 (1988).