Atomic layer deposition of tantalum nitride on organosillcate and organic polymer-based low dielectric constant materials

Materials Research Society Symposium Proceedings

Volumn 812, Issue , 2004, Pages 165-170

  Van Der Straten, Oscar ^a   Zhu, Yu ^a   Rullan, Jonathan ^a   Topol, Katarzyna ^a   Dunn, Kathleen ^a   Kaloyeros, Alain ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); EQUILIBRIUM CRYSTAL SHAPE (ECS); INTERFACIAL ROUGHNESS; ORGANOSILICATES;

AMMONIA; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; DIELECTRIC MATERIALS; FILM GROWTH; METALLIZING; ORGANIC POLYMERS; PERMITTIVITY; PYROLYSIS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICATES; SURFACE ROUGHNESS; TUNGSTEN COMPOUNDS;

DEPOSITION;

EID: 12844280486     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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