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Volumn 42, Issue 17, 2009, Pages

Diagnostic and processing in SF6 RF remote plasma for silicon etching

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FLUORINE; CONSTANT PRESSURES; ELECTRON DENSITIES; ETCH RATES; ETCHED SURFACE; FLUORINE ATOMS; HOLLOW CATHODE DISCHARGE; ION FLUXES; OPTICAL REFLECTANCE; PHOTOLUMINESCENCE PROPERTIES; PLASMA POTENTIAL; REMOTE PLASMAS; RF REMOTE PLASMA; RF-POWER; SILICON ETCHING; SILICON SURFACES; SUBSTRATE HOLDERS; VISIBLE PHOTOLUMINESCENCE;

EID: 70249118959     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/17/175206     Document Type: Article
Times cited : (20)

References (60)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.