Surface texturing for silicon solar cells using reactive ion etching technique

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2002, Pages 258-261

  Kumaravelu, G ^a   Alkaisi, M M ^a   Bittar, A ^b  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

^b CALLAGHAN INNOVATION   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; FAILURE ANALYSIS; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; REFLECTION; TEXTURES;

SURFACE TEXTURING; TEXTURING STRUCTURES;

SILICON SOLAR CELLS;

EID: 0036948375     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. M.A. Green, Solar Cells: Operating principles, Technology and System Applications, vol. 1. Kensington new South Wales: University of New South Wales, 1982.
2. S Narayanan, "High efficiency polycrystalline silicon solar cells" PhD dissertation, Univ. of New South Wales, Sydney, Australia, 1989.
3. P. Path, G. Wileke, E. Bucher, J. Szlufcic, R.M. Murti, K. De Clercq, J. Nijs, and R.Mertens, "Mechanical wafer engineering for high efficiency Solar Cells: An Investigation of the induced Surface Damage" in Proc. 24th IEEE Photovoltaic Specialist Conf., 1994, pp. 1347-1350.
4. R.R. Bilyalov, L. Stalmans, L. Schirone, et al., "Use of porus silicon antireflection coating in multicrystalline silicon solar cell processing". IEEE Trans. Electron Devices 46, 1999, pp. 2035-2040.
5. H. Jansen, M.D. Boer, R. Legtenberg, et al., "The black silicon method: a universal method for determining parameter settings of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control", Journal of Micromechanics and Microengineering 5, 1995, pp. 115-120.
6. J.Zhao, A.Wang, M.A.Green, et al., "19.8% efficient "honeycomb" textured multicrystalline and 24.4% monocrystalline silicon solar cells", appl. Phys. Lett. 73, and 1998, pp. 1991-1993.
7. E.J. Teo, M.M. Alkaisi, A.A. Bettiol, T. Osipowicz, J. Van Kan, F. Watt, Andears Markwitz, "Sub-micron channelling contrast microscopy (CCM) on reactive ion etched deep silicon microstructures." Nuclear Instruments and Methods in Physics Research B 190, (2002) 339-344.
8. T. Wells, M.M. El-Gomati and J.Wood, "Low temperature reactive Ion etching of silicon with SF6/O2 plasmas", J. Vac, Sci Technol. B 15, 1997, pp. 339.
9. Martin Schnell, Ralf Ludemann, Sebastian Schaefer, "Plasma surface texturization for multicrystalline silicon solar cells", Proc. 28th IEEE Photovoltaic Specialists Conf. 2000, pp. 367 - 370.