Electrostatic probe measurement of the negative ion fraction in an SF6 helicon discharge

Plasma Sources Science and Technology

Volumn 8, Issue 4, 1999, Pages 561-566

  Chabert, P ^a   Sheridan, T E ^b   Boswell, R W ^b   Perrin, J ^c  

^a CNRS   (France)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^c Balzers Process Systems   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTROSTATICS; HELICONS; IMPACT IONIZATION; IONS; MAGNETIC FIELD EFFECTS; PLASMA CONFINEMENT; PLASMA PROBES; PLASMA SHEATHS;

BOHM FLUX; SULFUR HEXAFLUORIDE;

PLASMAS;

EID: 0033334589     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/4/306     Document Type: Article

References (21)

1. Sheridan T E, Chabert P and Boswell R W 1999 Plasma Sources Sci. Technol. 8 457
2. Boyd R L F and Thompson J B 1959 Proc. R. Soc. A 252 102
3. Braithwaite N St J and Allen J E 1988 J. Phys. D: Appl. Phys. 21 1733
4. Choi S J and Kushner M J 1993 J. Appl. Phys. 74 853
5. Howling A A, Sansonnens L, Dorier J-L and Hollenstein Ch 1994 J. Appl. Phys. 75 1340
6. Overzet L J. Smith B A, Kleber J and Kanakasabapathy S K 1997 Japan. J. Appl. Phys. 36 2443
7. Samukawa S 1996 Appl. Phys. Lett. 68 316
8. Lichtenberg A J, Vahedi V, Lieberman M A and Rognlien T 1994 J. Appl. Phys. 75 2339
9. Vender D. Stoffels W W, Stoffels E, Kroesen G M W and de Hoog F J 1995 Phys. Rev. E 51 2436
10. Bacal M, Hamilton G W. Bruneteau A M, Doucet H J and Taillet J 1979 Rev. Sci. Instrum. 50 719
11. Gottscho R A and Gaebe C E 1986 IEEE Trans. Plasma Sci. 14 92
12. Kono A, Endo M, Ohata K, Kishimoto S and Goto T 1994 J. Appl. Phys. 76 7221
13. Hayashi D and Katoda K 1998 J. Appl. Phys. 83 697
14. Kawai R and Mieno T 1997 Japan. J. Appl. Phys. 36 L1123
15. St-Onge L, Margot J and Chaker M 1998 Appl. Phys. Lett. 72 290
16. Nikitin A G, El Balghiti F and Bacal M 1996 Plasma Sources Sci. Technol. 5 37
17. Chabert P, Boswell R W and Davis C 1998 J. Vac. Sci. Technol. A 16 78
18. Ohtsu Y, Seki T and Fujita H 1996 Japan. J. Appl. Phys. 35 4494
19. Phelps A V and Van Brunt R J 1998 J. Appl. Phys. 64 4269
20. Zeuner M, Neumann H, Zalman J and Bierdman H 1998 J. Appl. Phys. 83 5083
21. Kline L E 1986 IEEE Trans. Plasma Sci. 14 145