Diagnostics of reactive RF plasmas

Vacuum

Volumn 82, Issue 2 SPEC. ISS., 2008, Pages 217-219

  Barni, R ^a   Zanini, S ^a   Riccardi, C ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

Argon; Diagnostics; Plasma; Sulphur hexafluoride

Indexed keywords

ARGON; DOPING (ADDITIVES); ELECTRIC DISCHARGES; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; OPTICAL EMISSION SPECTROSCOPY; SULFUR HEXAFLUORIDE;

LOW PRESSURE DISCHARGE; REACTIVE ATOMIC FLUORINE; RESONANT INDUCTIVE COUPLING;

PLASMA DIAGNOSTICS;

EID: 35248874741     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.07.003     Document Type: Article

References (7)

1. Lieberman M.A., and Lichtenberg A.J. Principles of plasma discharges and materials processing (1994), Wiley, New York
2. Cruz-Barba L.E., Manolache S., and Denes F. Langmuir 18 (2002) 9393
3. Barni R., Riccardi C., Selli E., Massafra M.R., Marcandalli B., Orsini F., Poletti G., and Meda L. Plasma Proc Polymers 2 (2005) 64
4. Weiler M., Lang K., Li E., and Robertson. J Appl Phys Lett 72 (1998) 1314
5. Flender U., Nguyen Thi B.H., Wiesemann K., Khromov N.A., and Kolokolov N.B. Plasma Sources Sci Technol 5 (1996) 61
6. Hope D.A.O., Monnington G.J., Gill S.S., Borsing N., Smith J.A., and Rees J.C. Vacuum 44 (1993) 245
7. Pearse R.W.B., and Gaydon A.G. The identification of molecular spectra (1976), Wiley, new York