Formation and metrology of dual scale nano-morphology on SF6 plasma etched silicon surfaces

Nanotechnology

Volumn 19, Issue 25, 2008, Pages

  Boulousis, G ^a   Constantoudis, V ^a   Kokkoris, G ^a   Gogolides, E ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

MORPHOLOGY; SURFACE ROUGHNESS;

(1 1 0) SURFACE; NANO-MORPHOLOGY;

NANOSTRUCTURED MATERIALS;

SILICON; SULFUR HEXAFLUORIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; MATERIALS TESTING; MORPHOLOGY; NANOCHEMISTRY; NANOTECHNOLOGY; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS; WATER TEMPERATURE;

EID: 44949137224     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/25/255301     Document Type: Article

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