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Volumn 42, Issue 8, 2009, Pages

Effect of electron energy probability function on plasma CVD/modification in a 13.56 MHz hollow cathode discharge

Author keywords

[No Author keywords available]

Indexed keywords

ARGON GAS PRESSURE; ARGON PLASMAS; CHEMICAL GAS PHASE REACTIONS; DEPOSITED FILMS; ELECTRON DENSITIES; ELECTRON ENERGY PROBABILITY FUNCTIONS; EX SITU; FLOATING POTENTIALS; HEXAMETHYL DISILOXANE; HOLLOW CATHODE DISCHARGE; LANGMUIR PROBE DIAGNOSTICS; MODIFIED SURFACES; PLASMA PARAMETER; PLASMA POTENTIAL; PLASMA SURFACE MODIFICATIONS; PLASMA-CVD; POLYMER SURFACES; REMOTE PLASMA TREATMENT; REMOTE PLASMAS; REMOTE REGIONS; RUTHERFORD BACK-SCATTERING; SUBSTRATE BIAS; SUBSTRATE HOLDERS;

EID: 70350445537     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/8/085201     Document Type: Article
Times cited : (12)

References (46)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.