Plasma surface texturization for multicrystalline silicon solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 367-370

  Schnell, Martin ^a   Lüdemann, Ralf ^a   Schaefer, Sebastian ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; CRYSTAL ORIENTATION; SILICON; SILICON WAFERS; SOLAR CELLS;

BLACK SILICON METHODS; GRAIN ORIENTATION; HIGH-SHEET-RESISTANCE; INTERNAL RESISTANCE; LATERAL DIMENSION; MULTI-CRYSTALLINE SILICON SOLAR CELLS; PROCESS PARAMETERS; SURFACE RECOMBINATIONS;

SILICON SOLAR CELLS;

EID: 84949558411     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.915841     Document Type: Conference Paper

References (10)

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3. R. R. Bilyalov, R. Lüdemann, W. Wettling, et al, "Multicrystalline Silicon Solar Cells with Porous Silicon Emitter", Sol. Ener. Mater. Sol. Cells 60, 2000, pp. 391-420.
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7. H. Jansen, M. d. Boer, R. Legtenberg, et al, "The black silicon method: a universal method for deter-ming parameter settings of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control", J. Microm. Microeng. 5, 1995, pp. 115-120.
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9. 2plasmas", J. Vac. Sei. Technol. 815, 1997, pp. 397.
10. K. Shirasawa, K. Fukui, K. Okada, et al, "Over 17% large area multicrystalline silicon solar cells", Proc. 14th EC PVSEC, Barcelona, 1997, pp. 384.