Properties of thin films deposited from HMDSO/O2 induced remote plasma: Effect of oxygen fraction

Vacuum

Volumn 82, Issue 8, 2008, Pages 742-747

  Saloum, S ^a   Naddaf, M ^a   Alkhaled, B ^a  

^a DEPARTMENT OF MOLECULAR BIOLOGY AND BIOTECHNOLOGY   (Syrian Arab Republic)

Author keywords

Actinometry; Corrosion behavior; FTIR; HMDSO; O2 fraction; Optical properties; Remote plasma

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; OPTICAL PROPERTIES; OXYGEN; PLASMA APPLICATIONS;

OXYGEN FRACTION; REMOTE PLASMA;

THIN FILMS;

EID: 41149160834     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.10.009     Document Type: Article

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