Effect of imprinting pressure on residual layer thickness in ultraviolet nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 3, 2005, Pages 1102-1106

  Lee, Heon ^a  

^a Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH PRESSURE EFFECTS; PRINTING; THICKNESS MEASUREMENT; ULTRAVIOLET RADIATION;

IMPRINTING PRESSURE; NANOSIZED PATTERNING; RESIDUAL LAYER THICKNESS; ULTRAVIOLET NANOIMPRINT LITHOGRAPHY;

NANOTECHNOLOGY;

HIGH PRESSURE; LITHOGRAPHY; PRINTING; THICKNESS; ULTRAVIOLET RADIATION;

EID: 31144470544     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1900732     Document Type: Article

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