-
2
-
-
0032116994
-
-
0021-4922,. 10.1143/JJAP.37.3889
-
H. S. Lee, B. J. Jun, D. D. Lee, K. H. Baik, and Y. S. Seol, Jpn. J. Appl. Phys., Part 1 0021-4922 37, 3889 (1998). 10.1143/JJAP.37.3889
-
(1998)
Jpn. J. Appl. Phys., Part 1
, vol.37
, pp. 3889
-
-
Lee, H.S.1
Jun, B.J.2
Lee, D.D.3
Baik, K.H.4
Seol, Y.S.5
-
5
-
-
0032336854
-
-
0734-2101,. 10.1116/1.581330
-
G. P. Kota, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 0734-2101 16, 2215 (1998). 10.1116/1.581330
-
(1998)
J. Vac. Sci. Technol. A
, vol.16
, pp. 2215
-
-
Kota, G.P.1
Coburn, J.W.2
Graves, D.B.3
-
6
-
-
0037361662
-
-
0167-9317,. 10.1016/S0167-9317(02)00962-0
-
H. W. Kim, B. S. Ju, and C. J. Kang, Microelectron. Eng. 0167-9317 65, 319 (2003). 10.1016/S0167-9317(02)00962-0
-
(2003)
Microelectron. Eng.
, vol.65
, pp. 319
-
-
Kim, H.W.1
Ju, B.S.2
Kang, C.J.3
-
7
-
-
0037364982
-
-
0167-9317,. 10.1016/S0167-9317(02)00902-4
-
H. W. Kim, B. S. Ju, C. J. Kang, and J. T. Moon, Microelectron. Eng. 0167-9317 65, 285 (2003). 10.1016/S0167-9317(02)00902-4
-
(2003)
Microelectron. Eng.
, vol.65
, pp. 285
-
-
Kim, H.W.1
Ju, B.S.2
Kang, C.J.3
Moon, J.T.4
-
8
-
-
0032067089
-
-
0021-4922,. 10.1143/JJAP.37.2634
-
E. J. Lee, J. W. Kim, and W. J. Lee, Jpn. J. Appl. Phys., Part 1 0021-4922 37, 2634 (1998). 10.1143/JJAP.37.2634
-
(1998)
Jpn. J. Appl. Phys., Part 1
, vol.37
, pp. 2634
-
-
Lee, E.J.1
Kim, J.W.2
Lee, W.J.3
-
9
-
-
0029273243
-
-
1071-1023,. 10.1116/1.588355
-
K. V. Guinn, C. C. Cheng, and V. M. Donnelly, J. Vac. Sci. Technol. B 1071-1023 13, 214 (1995). 10.1116/1.588355
-
(1995)
J. Vac. Sci. Technol. B
, vol.13
, pp. 214
-
-
Guinn, K.V.1
Cheng, C.C.2
Donnelly, V.M.3
-
10
-
-
0034315725
-
-
0734-2101,. 10.1116/1.1310655
-
S. A. Vitale, H. Chae, and H. H. Sawin, J. Vac. Sci. Technol. A 0734-2101 18, 2770 (2000). 10.1116/1.1310655
-
(2000)
J. Vac. Sci. Technol. A
, vol.18
, pp. 2770
-
-
Vitale, S.A.1
Chae, H.2
Sawin, H.H.3
-
11
-
-
0000907366
-
-
1071-1023,. 10.1116/1.584938
-
S. C. McNevin, J. Vac. Sci. Technol. B 1071-1023 8, 1185 (1990). 10.1116/1.584938
-
(1990)
J. Vac. Sci. Technol. B
, vol.8
, pp. 1185
-
-
McNevin, S.C.1
-
13
-
-
0027554488
-
-
0021-4922,. 10.1143/JJAP.32.1253
-
T. Morimoto, Jpn. J. Appl. Phys., Part 1 0021-4922 32, 1253 (1993). 10.1143/JJAP.32.1253
-
(1993)
Jpn. J. Appl. Phys., Part 1
, vol.32
, pp. 1253
-
-
Morimoto, T.1
-
14
-
-
0032679619
-
-
0261-8028,. 10.1023/A:1006642016630
-
K. H. Kwon, S. Y. Kang, S. H. Park, H. K. Sung, D. K. Kim, and J. H. Moon, J. Mater. Sci. Lett. 0261-8028 18, 1197 (1999). 10.1023/A:1006642016630
-
(1999)
J. Mater. Sci. Lett.
, vol.18
, pp. 1197
-
-
Kwon, K.H.1
Kang, S.Y.2
Park, S.H.3
Sung, H.K.4
Kim, D.K.5
Moon, J.H.6
-
15
-
-
0442278093
-
-
0013-4651,. 10.1149/1.1359204
-
S. Y. Kang, K. H. Kwon, S. I. Kim, S. K. Lee, M. Y. Jung, Y. R. Cho, Y. H. Song, J. H. Lee, and K. I. Cho, J. Electrochem. Soc. 0013-4651 148, G237 (2001). 10.1149/1.1359204
-
(2001)
J. Electrochem. Soc.
, vol.148
, pp. 237
-
-
Kang, S.Y.1
Kwon, K.H.2
Kim, S.I.3
Lee, S.K.4
Jung, M.Y.5
Cho, Y.R.6
Song, Y.H.7
Lee, J.H.8
Cho, K.I.9
-
16
-
-
0000195739
-
-
1071-1023,. 10.1116/1.588558
-
K. Nojiri, K. Tsunokuni, and K. Yamazaki, J. Vac. Sci. Technol. B 1071-1023 14, 1791 (1996). 10.1116/1.588558
-
(1996)
J. Vac. Sci. Technol. B
, vol.14
, pp. 1791
-
-
Nojiri, K.1
Tsunokuni, K.2
Yamazaki, K.3
-
17
-
-
2942692134
-
-
0042-207X,. 10.1016/j.vacuum.2004.03.005
-
A. M. Efremov, D. P. Kim, and C. I. Kim, Vacuum 0042-207X 75, 237 (2004). 10.1016/j.vacuum.2004.03.005
-
(2004)
Vacuum
, vol.75
, pp. 237
-
-
Efremov, A.M.1
Kim, D.P.2
Kim, C.I.3
-
18
-
-
0028975249
-
-
0036-8075,. 10.1126/science.268.5216.1443
-
V. Vaida and J. D. Simons, Science 0036-8075 268, 1443 (1995). 10.1126/science.268.5216.1443
-
(1995)
Science
, vol.268
, pp. 1443
-
-
Vaida, V.1
Simons, J.D.2
-
19
-
-
33646937128
-
-
0022-3654,. 10.1021/j100286a035
-
L. T. Molina and M. J. Molina, J. Phys. Chem. 0022-3654 91, 433 (1987). 10.1021/j100286a035
-
(1987)
J. Phys. Chem.
, vol.91
, pp. 433
-
-
Molina, L.T.1
Molina, M.J.2
-
22
-
-
0001371703
-
-
0022-3654,. 10.1021/j100365a033
-
J. B. Burkholder, J. J. Orlando, and C. J. Howard, J. Phys. Chem. 0022-3654 94, 687 (1990). 10.1021/j100365a033
-
(1990)
J. Phys. Chem.
, vol.94
, pp. 687
-
-
Burkholder, J.B.1
Orlando, J.J.2
Howard, C.J.3
-
23
-
-
0011647121
-
-
0300-9599,. 10.1039/f19797501648
-
R. A. Cox, R. G. Derwent, A. E. Eggleton, and H. J. Reid, J. Chem. Soc., Faraday Trans. 1 0300-9599 75, 1648 (1979). 10.1039/f19797501648
-
(1979)
J. Chem. Soc., Faraday Trans. 1
, vol.75
, pp. 1648
-
-
Cox, R.A.1
Derwent, R.G.2
Eggleton, A.E.3
Reid, H.J.4
-
24
-
-
84985311469
-
-
0538-8066,. 10.1002/kin.550110611
-
N. Basco and J. E. Hunt, Int. J. Chem. Kinet. 0538-8066 11, 649 (1979). 10.1002/kin.550110611
-
(1979)
Int. J. Chem. Kinet.
, vol.11
, pp. 649
-
-
Basco, N.1
Hunt, J.E.2
-
25
-
-
4444260630
-
-
0963-0252,. 10.1088/0963-0252/13/3/019
-
G. Cunge, M. Kogelschatz, and N. Sadeghi, Plasma Sources Sci. Technol. 0963-0252 13, 522 (2004). 10.1088/0963-0252/13/3/019
-
(2004)
Plasma Sources Sci. Technol.
, vol.13
, pp. 522
-
-
Cunge, G.1
Kogelschatz, M.2
Sadeghi, N.3
-
26
-
-
0036026394
-
-
1071-1023,. 10.1116/1.1511219
-
G. Cunge, R. L. Inglebert, O. Joubert, L. Vallier, and N. Sadeghi, J. Vac. Sci. Technol. B 1071-1023 20, 2137 (2002). 10.1116/1.1511219
-
(2002)
J. Vac. Sci. Technol. B
, vol.20
, pp. 2137
-
-
Cunge, G.1
Inglebert, R.L.2
Joubert, O.3
Vallier, L.4
Sadeghi, N.5
-
27
-
-
7544230698
-
-
0021-8979,. 10.1063/1.1786338
-
G. Cunge, M. Kogelschatz, and N. Sadeghi, J. Appl. Phys. 0021-8979 96, 4578 (2004). 10.1063/1.1786338
-
(2004)
J. Appl. Phys.
, vol.96
, pp. 4578
-
-
Cunge, G.1
Kogelschatz, M.2
Sadeghi, N.3
-
28
-
-
5644294565
-
-
0863-1042,. 10.1002/ctp200410082
-
M. Kogelschatz, G. Cunge, O. Joubert, L. Vallier, and N. Sadeghi, Contrib. Plasma Phys. 0863-1042 44, 413 (2004). 10.1002/ctpp.200410082
-
(2004)
Contrib. Plasma Phys.
, vol.44
, pp. 413
-
-
Kogelschatz, M.1
Cunge, G.2
Joubert, O.3
Vallier, L.4
Sadeghi, N.5
-
29
-
-
32644474964
-
-
0031-9007,. 10.1103/PhysRevLett.96.018306
-
P. F. Kurunczi, J. Guha, and V. M. Donnelly, Phys. Rev. Lett. 0031-9007 96, 018306 (2006). 10.1103/PhysRevLett.96.018306
-
(2006)
Phys. Rev. Lett.
, vol.96
, pp. 018306
-
-
Kurunczi, P.F.1
Guha, J.2
Donnelly, V.M.3
-
30
-
-
28144441079
-
-
1089-5647,. 10.1021/jp054190h
-
P. F. Kurunczi, J. Guha, and V. M. Donnelly, J. Phys. Chem. B 1089-5647 109, 20989 (2005). 10.1021/jp054190h
-
(2005)
J. Phys. Chem. B
, vol.109
, pp. 20989
-
-
Kurunczi, P.F.1
Guha, J.2
Donnelly, V.M.3
-
31
-
-
34248586638
-
-
0734-2101,. 10.1116/1.2699167
-
J. Guha, Y. K. Pu, and V. M. Donnelly, J. Vac. Sci. Technol. A 0734-2101 25, 347 (2006). 10.1116/1.2699167
-
(2006)
J. Vac. Sci. Technol. A
, vol.25
, pp. 347
-
-
Guha, J.1
Pu, Y.K.2
Donnelly, V.M.3
-
32
-
-
38349164719
-
-
0021-8979,. 10.1063/1.2828154
-
J. Guha, Y. K. Pu, and V. M. Donnelly, J. Appl. Phys. 0021-8979 103, 013306 (2008). 10.1063/1.2828154
-
(2008)
J. Appl. Phys.
, vol.103
, pp. 013306
-
-
Guha, J.1
Pu, Y.K.2
Donnelly, V.M.3
-
33
-
-
42949152424
-
-
0734-2101,. 10.1116/1.2902953
-
L. Stafford, J. Guha, and V. M. Donnelly, J. Vac. Sci. Technol. A 0734-2101 26, 455 (2008). 10.1116/1.2902953
-
(2008)
J. Vac. Sci. Technol. A
, vol.26
, pp. 455
-
-
Stafford, L.1
Guha, J.2
Donnelly, V.M.3
-
34
-
-
63749107395
-
-
0022-3727,. 10.1088/0022-3727/42/5/055206
-
L. Stafford, R. Khare, J. Guha, V. M. Donnelly, J. -S. Poirier, and J. Margot, J. Phys. D 0022-3727 42, 055206 (2009). 10.1088/0022-3727/42/5/055206
-
(2009)
J. Phys. D
, vol.42
, pp. 055206
-
-
Stafford, L.1
Khare, R.2
Guha, J.3
Donnelly, V.M.4
Poirier, J.-S.5
Margot, J.6
-
36
-
-
0000251646
-
-
1063-651X,. 10.1103/PhysRevE.60.6016
-
M. V. Malyshev and V. M. Donnelly, Phys. Rev. E 1063-651X 60, 6016 (1999). 10.1103/PhysRevE.60.6016
-
(1999)
Phys. Rev. e
, vol.60
, pp. 6016
-
-
Malyshev, M.V.1
Donnelly, V.M.2
-
37
-
-
5744243435
-
-
0022-3727,. 10.1088/0022-3727/37/19/R01
-
V. M. Donnelly, J. Phys. D 0022-3727 37, R217 (2004). 10.1088/0022-3727/37/19/R01
-
(2004)
J. Phys. D
, vol.37
, pp. 217
-
-
Donnelly, V.M.1
-
44
-
-
22144487419
-
-
0022-2461.
-
A. Efremov, K. H. Kwon, C. S. Park, S. I. Choi, C. I. Kim, and S. H. Chai, J. Mater. Sci. 0022-2461 16, 315 (2005).
-
(2005)
J. Mater. Sci.
, vol.16
, pp. 315
-
-
Efremov, A.1
Kwon, K.H.2
Park, C.S.3
Choi, S.I.4
Kim, C.I.5
Chai, S.H.6
-
45
-
-
0033743121
-
-
0963-0252,. 10.1088/0963-0252/9/2/304
-
N. C. M. Fuller, M. V. Malyshev, V. M. Donnelly, and I. P. Herman, Plasma Sources Sci. Technol. 0963-0252 9, 116 (2000). 10.1088/0963-0252/9/2/304
-
(2000)
Plasma Sources Sci. Technol.
, vol.9
, pp. 116
-
-
Fuller, N.C.M.1
Malyshev, M.V.2
Donnelly, V.M.3
Herman, I.P.4
-
49
-
-
33748631545
-
-
0956-5000,. 10.1039/a801529e
-
C. S. S. O'Connor, N. Tafadar, and S. D. Price, J. Chem. Soc., Faraday Trans. 0956-5000 94, 1797 (1998). 10.1039/a801529e
-
(1998)
J. Chem. Soc., Faraday Trans.
, vol.94
, pp. 1797
-
-
O'Connor, C.S.S.1
Tafadar, N.2
Price, S.D.3
-
50
-
-
67649561967
-
-
Ph.D. thesis, University of Houston.
-
J. Guha, Ph.D. thesis, University of Houston 2008.
-
(2008)
-
-
Guha, J.1
-
51
-
-
53549088610
-
-
1932-7447,. 10.1021/jp800788a
-
J. Guha, P. F. Kurunczi, L. Stafford, Y. K. Pu, and V. M. Donnelly, J. Phys. Chem. C 1932-7447 112, 8963 (2008). 10.1021/jp800788a
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 8963
-
-
Guha, J.1
Kurunczi, P.F.2
Stafford, L.3
Pu, Y.K.4
Donnelly, V.M.5
-
52
-
-
0011452551
-
-
0021-8979,. 10.1063/1.362613
-
V. M. Donnelly, J. Appl. Phys. 0021-8979 79, 9353 (1996). 10.1063/1.362613
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 9353
-
-
Donnelly, V.M.1
-
53
-
-
36749110861
-
-
0021-9606,. 10.1063/1.441718
-
F. A. Stevie and M. J. Vasile, J. Chem. Phys. 0021-9606 74, 5106 (1981). 10.1063/1.441718
-
(1981)
J. Chem. Phys.
, vol.74
, pp. 5106
-
-
Stevie, F.A.1
Vasile, M.J.2
-
54
-
-
0036655848
-
-
1050-2947,. 10.1103/PhysRevA.66.012708
-
Y. K. Kim and J. P. Desclaux, Phys. Rev. A 1050-2947 66, 012708 (2002). 10.1103/PhysRevA.66.012708
-
(2002)
Phys. Rev. A
, vol.66
, pp. 012708
-
-
Kim, Y.K.1
Desclaux, J.P.2
-
57
-
-
0042206851
-
-
0021-9606,. 10.1063/1.1585027
-
R. S. Zhu and M. C. Lin, J. Chem. Phys. 0021-9606 119, 2075 (2003). 10.1063/1.1585027
-
(2003)
J. Chem. Phys.
, vol.119
, pp. 2075
-
-
Zhu, R.S.1
Lin, M.C.2
|