Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2

Journal of Physics D: Applied Physics

Volumn 42, Issue 5, 2009, Pages

  Stafford, Luc ^a   Khare, Rohit ^b   Guha, Joydeep ^b   Donnelly, Vincent M ^b   Poirier, Jean Sébastien ^a   Margot, Jolle ^a  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIZED ALUMINIUMS; AUGER ELECTRON SPECTROMETERS; CHLORINE ADSORPTIONS; CHLORINE ATOMS; CL ATOMS; CYLINDRICAL SUBSTRATES; DESORPTION RATES; DISCHARGE TUBES; HIGH-DENSITY CHLORINE PLASMAS; INDUCTIVELY COUPLED CHLORINES; LANGMUIR-HINSHELWOOD; MOLECULAR CHLORINES; NUMBER DENSITIES; OXYCHLORIDE; PLASMA CONDITIONS; POROUS STAINLESS STEELS; PRESSURE RISE; RECOMBINATION COEFFICIENTS; STAINLESS STEEL SUBSTRATES; STAINLESS STEEL SURFACES; SUBSTRATE ROTATIONS;

ADSORPTION; ALUMINUM; ANODIC OXIDATION; ATOMS; AUGERS; CHLORINE; DESORPTION; ELECTRIC DISCHARGES; PLASMAS; ROTATION; SILICA; STEEL CORROSION; STEEL METALLURGY; SUBSTRATES; SURFACE MORPHOLOGY;

STAINLESS STEEL;

EID: 63749107395     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/5/055206     Document Type: Article

References (41)

1. Chang J P and Sawin H H 1997 J. Vac. Sci. Technol. A 15 1853
2. Chang J P, Arnold J C, Zau G C H, Shin H-S and Sawin H H 1997 J. Vac. Sci. Technol. A 15 610
3. Smith D L and Saviano P G 1982 J. Vac. Sci. Technol. 21 768
4. Danner D A and Hess D W 1986 J. Appl. Phys. 59 940
5. Mahorowala A P and Sawin H H 2002 J. Vac. Sci. Technol. B 20 1077
6. Lee C, Graves D B and Lieberman M A 1996 Plasma Chem. Plasma Process. 16 99
7. Lee C M and Lieberman M A 1995 J. Vac. Sci. Technol. A 13 368
8. Deshmukh S C and Economou D J 1992 J. Appl. Phys. 72 4597
9. Wise R S, Lymberopoulos D P and Economou D J 1995 Plasma Sources Sci. Technol. 4 317
10. Lymberopoulos D P and Economou D J 1995 IEEE Trans. Plasma Sci. 23 573
11. Malyshev M V and Donnelly V M 2001 J. Appl. Phys. 90 1130
12. Stafford L, Margot J, Vidal F, Chaker M, Giroux K, Poirier J S, Quintal-Léonard A and Saussac J 2005 J. Appl. Phys. 98 063301
13. Lee G W and Kang Y B 2003 Electrochem. Solid State Lett. 6 G49
14. Miwa K and Mukai T 2002 J. Vac. Sci. Technol. B 20 2120
15. Cunge G, Joubert O and Sadeghi N 2003 J. Appl. Phys. 94 6285
16. Agarwal A and Kushner M J 2008 J. Vac. Sci. Technol. A 26 498
17. Ullal S J, Godfrey A R, Edelberg E, Braly L, Vahedi V and Aydil E S 2002 J. Vac. Sci. Technol. A 20 43
18. Guha J, Kurunczi P F, Stafford L, Donnelly V M and Pu Y-K 2008 J. Phys. Chem. C 112 8963
19. Stafford L, Guha J and Donnelly V M 2008 J. Vac. Sci. Technol. A 26 455
20. Kota G P, Coburn J W and Graves D B 1998 J. Vac. Sci. Technol. A 16 270
21. Malyshev M V and Donnelly V M 2000 J. Appl. Phys. 88 6207
22. Corr C S, Despiau-Pujo E, Chabert P, Graham W G, Marro F G and Graves D B 2008 J. Phys. D: Appl. Phys. 41 185202
23. Tserepi A D and Miller T A 1995 J. Appl. Phys. 77 505
24. Gomez S, Steen P G and Graham W G 2002 Appl. Phys. Lett. 81 19
25. Hsu C-C, Nierode M A, Coburn J W and Graves D B 2006 J. Phys. D: Appl. Phys. 39 3272
26. Kurunczi P F, Guha J and Donnelly V M 2005 J. Phys. Chem. B 109 20989
27. Guha J, Donnelly V M and Pu Y-K 2008 J. Appl. Phys. 103 013306
28. Kurunczi P F, Guha J and Donnelly V M 2006 Phys. Rev. Lett. 96 018306
29. Rao T, Vook R W, Meyer W and Joshi A 1986 J. Vac. Sci. Technol. A 4 1604
30. Lee S-J and Lai J-J 2003 J. Mater. Proc. Technol. 140 206
31. Baker M A 1980 Thin Solid Films 69 359
32. Guha J, Pu Y-K and Donnelly V M 2006 J. Vac. Sci. Technol. A 25 347-52
33. Oura K, Lifshits V G, Saranin A A, Zotov A V and Katayama M 2003 Surface Science, An Introduction (Berlin: Springer) pp 295-308 chapter 12
34. Kim Y C and Boudart M 1991 Langmuir 7 2999
35. Cartry G, Magne L and Cernogora G 2000 J. Phys. D: Appl. Phys. 33 1303
36. Lafferty J M (ed) 1998 Foundations of Vacuum Science and Technology (New York: Wiley) p 619
37. Malyshev M V and Donnelly V M 2000 J. Appl. Phys. 88 6207
38. Ogryzlo E A 1961 Can. J. Chem. 39 2256
39. Donnelly V M 1996 J. Vac. Sci. Technol. A 14 1076
40. Stafford L, Margot J, Chaker M and Pauna O 2003 J. Appl. Phys. 93 1907
41. Richards A D and Sawin H H 1987 J. Appl. Phys. 62 799