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Journal of Materials Science: Materials in Electronics

Volumn 16, Issue 6, 2005, Pages 315-321

Plasma parameters and volume kinetics in Cl2/O2 mixtures

(6) Efremov, A a Kwon, K H e Park, C S b Choi, S I b Kim, C I c Chai, S H d

a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY (Russian Federation)

b Hanseo University (South Korea)

c Chung Ang University (South Korea)

d Hoseo University (South Korea)

e Korea University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CHLORINE; ELECTRONS; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; MATHEMATICAL MODELS; MIXTURES; OXYGEN; PROBABILITY DISTRIBUTIONS; PROBES;

KINETIC EQUATION; PLASMA PARAMETERS; VOLUME KINETICS;

PLASMA ETCHING;

EID: 22144487419 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1007/s10854-005-1141-y Document Type: Article

Times cited : (4)

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