Auger electron spectroscopy of surfaces during exposure to gaseous discharges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 2, 2007, Pages 347-352

  Guha, Joydeep ^a   Pu, Yi Kang ^b   Donnelly, Vincent M ^a  

^a UNIVERSITY OF HOUSTON   (United States)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANODIC OXIDATION; AUGER ELECTRON SPECTROSCOPY; CHARGING (BATTERIES); ELECTRIC INSULATORS; ELECTRON BEAMS; GASES; INDUCTIVELY COUPLED PLASMA; SUBSTRATES;

AUGER ANALYSIS; GASEOUS DISCHARGES; PLASMA REACTOR COATING; SUBSTRATE ROTATION FREQUENCY;

SURFACE DISCHARGES;

EID: 34248586638     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2699167     Document Type: Article

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