Etch Characteristics of Cr by Using Cl2/O2 Gas Mixtures with Electron Cyclotron Resonance Plasma

Journal of the Electrochemical Society

Volumn 148, Issue 5, 2001, Pages

  Kang, Seung Youl ^a   Kwon, Kwang Ho ^b   Kim, Sung Ihl ^c   Lee, Sang Kyun ^a   Jung, Moon Youn ^a   Cho, Young Rae ^a   Song, Yoon Ho ^a   Lee, Jin Ho ^a   Cho, Kyoung Ik ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Hanseo University   (South Korea)

^c Daejeon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0442278093     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1359204     Document Type: Article

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