A 100 nanometer scale resistive heater-thermometer on a silicon cantilever

Nanotechnology

Volumn 20, Issue 9, 2009, Pages

  Dai, Z ^a   King, W P ^a   Park, K ^b  

^a University of Illinois at Urbana Champaign   (United States)

^b University of Rhode Island   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING PARAMETERS; ANNEALING PROCESS; FREE ENDS; HEATING TIME; MAXIMUM TEMPERATURES; MICRO CANTILEVERS; MINIMUM FEATURE SIZES; NANO-METER SCALE; RESISTIVE HEATERS; SHARP TIPS; SILICON CANTILEVERS;

ATOMIC FORCE MICROSCOPY; NANOCANTILEVERS; PHOTORESISTS; TEMPERATURE SENSORS; THERMOMETERS;

PROCESS CONTROL;

SILICON;

ARTICLE; CONTROLLED STUDY; MOLECULAR SIZE; NANOFABRICATION; PRIORITY JOURNAL; PRODUCT DEVELOPMENT; SCANNING PROBE MICROSCOPY; SURFACE PROPERTY; TEMPERATURE; THERMAL EXPOSURE; THERMOMETER; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; HEATING; IMPEDANCE; INSTRUMENTATION; MICROELECTROMECHANICAL SYSTEM; NANOTECHNOLOGY;

ELECTRIC IMPEDANCE; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HEATING; MICRO-ELECTRICAL-MECHANICAL SYSTEMS; NANOTECHNOLOGY; SILICON; THERMOMETERS;

EID: 65449163479     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/9/095301     Document Type: Article

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