Formation and process optimization of scanning resistive probe

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 5, 2006, Pages 2417-2420

  Shin, Hyunjung ^a   Kim, Chanhyung ^a   Lee, Bongki ^b   Kim, Jiyoung ^b   Park, Hongsik ^c   Min, Dong Ki ^c   Jung, Juwhan ^c   Hong, Seungbum ^c   Kim, Sungdong ^d  

^a Kookmin University   (South Korea)

^b The University of Texas at Dallas   (United States)

^c Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^d Seoul National University of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

KELVIN PROBE FORCE MICROSCOPY; PROCESS OPTIMIZATION; SCANNING RESISTIVE PROBE; SURFACE CHARGES;

DIFFUSION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; SURFACE PHENOMENA;

PROBES;

EID: 33749358568     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2354163     Document Type: Article

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