New fabrication process for monolithic probes with integrated heaters for nanothermal machining

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 1 A, 2006, Pages 208-214

  Chiou, Chi Han ^a   Chang, Shang Jen ^a   Lee, Gwo Bin ^a   Lee, Huei Huang ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

AFM probe; Atomic force microscope; Epitaxial wafer; Microheater; Resonant frequency; Spring constant; Thermal machining

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; ETCHING; FABRICATION; NATURAL FREQUENCIES; SINGLE CRYSTALS;

AFM PROBE; MICROHEATER; SPRING CONSTANT; THERMAL MACHINING;

MICROMACHINING;

EID: 31544446603     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.208     Document Type: Article

References (32)

1. G. Binnig, C. F. Quate and C. H. Gerber: Phys. Rev. Lett. 56 (1986) 930.
2. T. R. Albrecht, S. Akamine, T. E. Carver and C. F. Quate: J. Vac. Sci. Technol. A 8 (1990) 3386.
3. J. Itoh, Y. Tohma, S. Kanemaru and K. Shimizu: J. Vac. Sci. Technol. 813 (1995) 331.
4. A. Boisen, O. Hanseny and S. Bouwstray: J. Micromech. Microeng. 6 (1996) 58.
5. A. Folch, M. S. Wrighton and M. A. Schmidt: IEEE J. Microelectromech. Syst. 6 (1997) 303.
6. C. Liu and R. Gamble: Sens. Actuators A 71 (1998) 233.
7. A. Chand, M. B. Viani, T. E. Schaffer and P. K. Hansma: IEEE J. Microelectromech. Syst. 9 (2000) 112.
8. P. Call-Borrut, B. Belier, P. Falgayrettes, M. Castagne, C. Bergaud and P. Temple-Boyer: J. Microsc. 202 (2001) 34.
9. R. Piner, J. Zhu, F. Xu, S. Hong and C. A. Mirkin: Science 283 (1999) 661.
10. J. H. Bae, T. Ono and M. Esashi: Diamond Relat. Mater. 12 (2003) 2128.
11. S. Lee, J. Kim, W. S. Shin, H. J. Lee, S. Koo and H. Lee: Mater. Sci. Eng. C 24 (2004) 3.
12. H. J. Mamin and D. Rugar: Appl. Phys. Lett. 61 (1992) 1003.
13. H. J. Mamin, L. S. Fan, S. Hoen and D. Rugar: Sens. Actuators A 48 (1995) 215.
14. B. W. Chui, T. D. Stowe, Y. S. Ju, K. E. Goodson, T. W. Kenny, H. J. Mamin, B. D. Terris, R. P. Ried and D. Rugar: IEEE J. Microelectromech. Syst. 7 (1998) 69.
15. D. W. Lee, T. Ono, T. Abe and M. Esashi: IEEE J. Microelectromech. Syst. 11 (2002) 215.
16. D. W. Lee, T. Ono and M. Esashi: J. Micromech. Microeng. 12 (2002) 841.
17. U. Drechsler, N. Burer, M. Despont, U. Durig, B. Gotsmann, F. Robin and P. Vettiger: Microelectron. Eng. 67-68 (2003) 397.
18. D. Saya, K. Fukushima, H. Toshiyoshi, G. Hashiguchi, H. Fujita and H. Kawakatsu: Sens. Actuators A 95 (2002) 281.
19. A. Gupta, J. P. Denton, H. McNally and R. Bashir: IEEE J. Microelectromech. Syst. 12 (2003) 185.
20. J. P. Cleveland, S. Manne, D. Bocek and P. K. Hansma: Rev. Sci. Instrum. 64 (1993) 403.
21. J. E. Sader, I. Larson, P. Mulvaney and L. R. White: Rev. Sci. Instrum. 66 (1996) 3789.
22. C. T. Gibson, G. S. Watson and S. Myhra: Nanotechnology 7 (1996) 259.
23. A. Torii, M. Sasaki, K. Hane and S. Okuma: Meas. Sci. Technol. 7 (1996) 179.
24. J. Yang, T. Ono and M. Esashi: Sens. Actuators A 82 (2000) 102.
25. R. Levy and M. Maaloum: Nanotechnology 13 (2002) 33.
26. C. T. Gibson, B. L. Weeks, C. A. Abell, T. Rayment and S. Myhra: Ultramicroscopy 97 (2003) 113.
27. W. F. Stokey: Shock and Vibration Handbook (McGraw-Hill, New York, 1989).
28. H. C. Tsai and W. L. Fang: Sens. Actuators A 103 (2003) 377.
29. C. H. Mastrangelo, J. H-J. Yeh and R. S. Muller: IEEE Trans. Electron Devices 39 (1992) 1363.
30. J. Chen and K. D. Wise: IEEE Trans. Biomed. Eng. 44 (1997) 770.
31. J. H. Das and N. C. MacDonald: J. Vac. Sci. Technol. B 13 (1995) 2432.
32. M. Asheghia, K. Kurabayashi, R. Kasnavi and K. E. Goodson: J. Appl. Phys. 91 (2002) 5079.