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Journal of Applied Physics

Volumn 104, Issue 6, 2008, Pages

Scanning tunneling microscopy study of nitrogen incorporated HfO 2

(7) Ong, Y C a Ang, D S a O'Shea, S J b Pey, K L a Wang, S J b Tung, C H c Li, X a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING (Singapore)

c INSTITUTE OF MICROELECTRONICS (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749151453 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2982406 Document Type: Article

Times cited : (8)

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