Residual stress, microstructure, and structure of tungsten thin films deposited by magnetron sputtering

Journal of Applied Physics

Volumn 87, Issue 1, 2000, Pages 177-187

  Shen, Y G ^a   Mai, Y W ^a   Zhang, Q C ^a   McKenzie, D R ^a   McFall, W D ^a   McBride, W E ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002863812     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371841     Document Type: Article

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