In situ manipulation and characterizations using nanomanipulators inside a field emission-scanning electron microscope

Review of Scientific Instruments

Volumn 74, Issue 9, 2003, Pages 4021-4025

  Kim, Keun Soo ^a   Lim, Seong Chu ^a   Lee, Im Bok ^a   An, Key Heyok ^a   Bae, Dong Jae ^a   Choi, Shinje ^b   Yoo, Jae Eun ^b   Lee, Young Hee ^a  

^a Sungkyunkwan University   (South Korea)

^b Nanotechnology R and D Center   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; ELECTRON BEAMS; ELECTRON IRRADIATION; PIEZOELECTRIC DEVICES; SCANNING ELECTRON MICROSCOPY; TUNGSTEN;

NANOMANIPULATORS;

MICROMANIPULATORS;

EID: 0142039176     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1597955     Document Type: Article

References (22)

1. T. Ando, Y. Arakawa, K. Furuya, S. Komiyama, and H. Nakashima, Mesoscopic Physics and Electronics (Springer, New York, 1998), p. 4.
2. G. Timp, Nanotechnology (American Institute of Physics, New York, 1999), p. 471.
3. C. W. Teng, J. F. Muth, R. M. Kolbas, K. M. Hassan, A. K. Sharma, A. Kvit, and J. Narayan, Appl. Phys. Lett. 76, 43 (2000).
4. Z. Yao, H. W. Ch. Postma, L. Balents, and C. Dekker, Nature (London) 402, 270 (1999).
5. D. L. Klein, R. Roth, A. K. L. Lim, P. Alivisatos, and P. L. McEune, Nature (London) 389, 699 (1997).
6. Z. L. Wang, P. Poncharal, and W. A. de Heer, Pure Appl. Chem. 72, 209 (2000).
7. K. Suenage, C. Colliex, and S. Iijima, Appl. Phys. Lett. 78, 70 (2001).
8. T. Kuzumaki, H. Sawada, H. Ichinose, Y. Horiike, and T. Kizuka, Appl. Phys. Lett. 79, 4580 (2001).
9. H. W. C. Postma, A. Sellmeijer, and C. Dekker, Adv. Mater. (Weinheim, Ger.) 12, 1299 (2000).
10. J.-P. Salvetat, A. J. Kulik, J.-M. Bonard, G. Andrew, D. Briggs, T. Stöckli, K. Méténier, S. Bonnamy, F. Béguin, N. A. Burnham, and L. Forró, Adv. Mater. (Weinheim, Ger.) 11, 161 (1999).
11. Instructional manual for nanomanipulator, Klocke Nanotechnik.
12. A. I. Oliva, A. Romero, J. L. Pena, E. Anguiano, and M. Aguilar, Rev. Sci. Instrum. 67, 1917 (1996).
13. K. S. Kim, S. C. Lim, and Y. H. Lee (unpublished).
14. Y. S. Park, K. S. Kim, H. J. Jeong, W. S. Kim, J. M. Moon, K. H. An, D. J. Bae, G. S. Park, and Y. H. Lee, Synth. Met. 126, 245 (2002).
15. T. Fujii, M. Suzuki, M. Miyashita, M. Yamaguchi, T. Onuki, H. Nakamura, T. Matsubara, H. Yamada, and K. Nakayama, J. Vac. Sci. Technol. B 9, 666 (1991).
16. H. Nishijima, S. Kamo, S. Akita, Y. Nakayama, K. I. Hohmura, S. H. Yoshimura, and K. Takeyasu, Appl. Phys. Lett. 74, 4061 (1999).
17. M. Ishikawa, M. Yoshimura, and K. Ueda, Physica B 323, 184 (2002).
18. P. Kim and C. M. Lieber, Science 286, 2148 (1999).
19. M.-F. Yu, O. Lourie, M. J. Dyer, K. Moloni, T. F. Kelly, and R. S. Rouff, Science 287, 637 (2000).
20. J. Cumings and A. Zettl, Science 289, 602 (2000).
21. A. Kuznetsova, D. B. Mawhinney, V. Naumenko, J. T. Yates, Jr., J. Liu, and R. E. Smalley, Chem. Phys. Lett. 321, 292 (2000).
22. F. Banhart, Nano Lett. 1, 329 (2001).