Structural, optical properties and band gap alignments of ZrOxNy thin films on Si (1 0 0) by radio frequency sputtering at different deposition temperatures

Applied Surface Science

Volumn 254, Issue 17, 2008, Pages 5439-5444

  Zhu, L Q ^a   Fang, Q ^b   Wang, X J ^a   Zhang, J P ^a   Liu, M ^a   He, G ^a   Zhang, L D ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Band offset; Spectroscopy ellipsometry; Sputtering; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ENERGY GAP; MAGNETRON SPUTTERING; MEAN SQUARE ERROR; VALENCE BANDS; X RAY PHOTOELECTRON SPECTROSCOPY;

RADIO FREQUENCY SPUTTERING; SPECTROSCOPY ELLIPSOMETRY;

THIN FILMS;

EID: 43849093872     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.02.073     Document Type: Article

References (36)

1. G.D. Wilk R.M. Wallance J.M. Anthony J. Appl. Phys. 89 2001 5243
2. G. He Q. Fang M. Liu L.Q. Zhu L.D. Zhang J. Cryst. Growth 268 2004 155
3. J.M. Howard V. Craciun V. Essary R.K. Singh Appl. Phys. Lett. 81 2002 3431
4. L.Q. Zhu G. He M. Liu Q. Fang L.D. Zhang Mater. Lett. 60 2006 888
5. M.A. Q-Lopez M. El-Bouanani M.J. Kim B.E. Gnade R.M. Wallace M.R. Visokay A. Li-Fatou M.J. Bevan L. Colombo Appl. Phys. Lett. 81 2002 1609
6. C.S. Kang H.-J. Cho K. Onishi R. Nieh R. Choi S. Gopalan S. Krishnan J.H. Han J.C. Lee Appl. Phys. Lett. 81 2002 2593
7. M. Couillard M.S. Lee D. Landheer X. Wu G.A. Botton J. Electrochem. Soc. 152 2005 F101
8. A.P. Huang R.K.Y. Fu P.K. Chu L. Wang W.Y. Cheung J.B. Xu S.P. Wong J. Cryst. Growth 277 2005 422
9. H. Jung H. Yang K. Im H. Hwang Appl. Phys. Lett. 79 2001 4408
10. H. Jung K. Im D. Yang H. Hwang IEEE Electron. Dev. Lett. 21 2000 563
11. M. Liu G. He L.Q. Zhu Q. Fang G.H. Li L.D. Zhang Appl. Surf. Sci. 252 2006 6206
12. M. Liu Q. Fang G. He L.Q. Zhu L.D. Zhang Appl. Surf. Sci. 252 2006 8673
13. S. Venkataraj O. Kappertz R. Jayavel M. Wuttig J. Appl. Phys. 92 2002 2461
14. X.B. Lu X. Zhang R. Huang H.B. Lu Z.H. Chen W.F. Xiang M. He B.L. Cheng H.W. Zhou X.P. Wang C.Z. Wang B.Y. Nguyen Appl. Phys. Lett. 84 2004 2620
15. Y.C. Liang Y.C. Liang J. Cryst. Growth 285 2005 345
16. L.Q. Zhu L.D. Zhang G.H. Li G. He M. Liu Q. Fang Appl. Phys. Lett. 88 2006 232901
17. W.J. Maeng H. Kim Appl. Phys. Lett. 91 2007 092901
18. W. Li X. Liu A. Huang P.K. Chu J. Phys. D: Appl. Phys. 40 2007 2293 2299
19. D.A. Neumayer E. Cartier J. Appl. Phys. 90 2001 1801
20. G. He L.D. Zhang Q. Fang J. Appl. Phys. 100 2006 083517
21. A.W. Adamson Physical Chemistry of Surface 1967 Wiley New York p. 24
22. L.Q. Zhu Q. Fang G. He M. Liu L.D. Zhang Nanotechnology 16 2005 2865
23. P. Patsalas S. Logothetidis L. Sygellou S. Kennou Phys. Rev. B 68 2003 035104
24. H.T. Fan X.M. Teng S.S. Pan C. Ye G.H. Li L.D. Zhang Appl. Phys. Lett. 87 2005 231916
25. J.P. Masse H. Szymanowski O. Zabeida A. Amassian J.E. Klemberg-Sapieha L. Martinu Thin Solid Films 515 2006 1674
26. J.P. Zhang G. He L.Q. Zhu M. Liu S.S. Pan L.D. Zhang Appl. Surf. Sci. 253 2007 9414 9421
27. M. Sousa C. Rossel C. Marchiori H. Siegwart D. Caimi J.-P. Locquet D.J. Webb R. Germann J. Fompeyrine K. Babich J.W. Seo Ch. Dieker J. Appl. Phys. 102 2007 104103
28. G. He L.D. Zhang G.H. Li M. Liu L.Q. Zhu S.S. Pan Q. Fang Appl. Phys. Lett. 86 2005 232901
29. M. Liu Q. Fang G. He L. Li L.Q. Zhu G.H. Li L.D. Zhang Appl. Phys. Lett. 88 2006 192904
30. H.Y. Yu M.F. Li B.J. Cho C.C. Yeo M.S. Joo D.L. Kwong J.S. Pan C.H. Ang J.Z. Zheng S. Ramanathan Appl. Phys. Lett. 81 2002 376
31. M.L. Huang Y.C. Chang C.H. Chang T.D. Lin J. Kwo T.B. Wu M. Hong Appl. Phys. Lett. 89 2006 012903
32. H. Jin S.K. Oh H.J. Kang M.H. Cho Appl. Phys. Lett. 89 2006 122901
33. G. Shang P.W. Peacock J. Robertson Appl. Phys. Lett. 84 2004 106
34. P.W. Peacock J. Robertson J. Appl. Phys. 92 2002 4712
35. S. Sayan Appl. Phys. Lett. 87 2006 212905
36. G. Lucovsky G.B. Rayner Jr. D. Kang G. Appel R.S. Johnson Y. Zhang D.E. Sayers H. Ade J.L. Whitten Appl. Phys. Lett. 79 2001 1775