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Materials Letters

Volumn 60, Issue 7, 2006, Pages 888-891

Interfacial and optical properties of ZrO2/Si by reactive magnetron sputtering

(5) Zhu, L Q a Fang, Q a,b He, G a Liu, M a Zhang, L D a

a INSTITUTE OF SOLID STATE PHYSICS (China)

b UNIVERSITY COLLEGE LONDON (United Kingdom)

Author keywords

Absorption coefficient; Dielectrics; Spectroscopic ellipsometry; Thin films

Indexed keywords

ABSORPTION; DIELECTRIC MATERIALS; MAGNETRON SPUTTERING; SILICON; SPECTROSCOPIC ANALYSIS; THIN FILMS; X RAY DIFFRACTION;

ABSORPTION COEFFICIENT; ABSORPTION TAILS; DEFECT ENERGY LEVEL; OXYGEN VACANCIES; SPECTROSCOPIC ELLIPSOMETRY;

OPTICAL PROPERTIES;

EID: 29444432653 PISSN: 0167577X EISSN: None Source Type: Journal
DOI: 10.1016/j.matlet.2005.10.039 Document Type: Article

Times cited : (24)

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