Microstructure and interfacial properties of HfO 2 -Al 2 O 3 nanolaminate films

Applied Surface Science

Volumn 252, Issue 18, 2006, Pages 6206-6211

  Liu, M ^a   He, G ^a   Zhu, L Q ^a   Fang, Q ^a,b   Li, G H ^a   Zhang, L D ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Crystallization; Interface; Magnetron sputtering

Indexed keywords

ALUMINA; DIELECTRIC FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

COMPOSITE GATE DIELECTRIC THIN FILMS; INTERFACE; PASSIVATION BARRIER;

HAFNIUM COMPOUNDS;

EID: 33746242371     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.08.022     Document Type: Article

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