Effect of oxygen partial pressure on the structural and optical properties of ZnO film deposited by reactive sputtering

Applied Surface Science

Volumn 253, Issue 24, 2007, Pages 9414-9421

  Zhang, J P ^a   He, G ^a   Zhu, L Q ^a   Liu, M ^a   Pan, S S ^a   Zhang, L D ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

Partial pressure; Spectroscopic ellipsometry; Tauc Lorentz; Zinc oxide thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; MORPHOLOGY; OPTICAL PROPERTIES; PARTIAL PRESSURE; SPECTROSCOPIC ELLIPSOMETRY; SPUTTERING; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTALLINITY; OXYGEN PARTIAL PRESSURE; RADIO-FREQUENCY SPUTTERING; ZINC OXIDE THIN FILMS;

THIN FILMS;

EID: 34548499917     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.06.005     Document Type: Article

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