Exposure parameters in proton beam writing for hydrogen silsesquioxane

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 8, 2008, Pages 1676-1679

  van Kan, J A ^a   Zhang, F ^a   Zhang, C ^a   Bettiol, A A ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Direct write; High aspect ratio; Nanolithography; Proton beam writing

Indexed keywords

ASPECT RATIO; ENERGY TRANSFER; MICROFABRICATION; NANOSTRUCTURES; PATTERN MATCHING; THREE DIMENSIONAL;

DIRECT WRITE; PROCESSING PARAMETERS; PROTON BEAM WRITING;

PROTON BEAMS;

EID: 43049181311     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.12.081     Document Type: Article

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