Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 803-809

  Peuker, M ^a   Lim, M H ^a   Smith, Henry I ^a   Morton, R ^b   van Langen Suurling, A K ^c   Romijn, J ^c   van der Drift, E W J M ^c   van Delft, F C M J M ^d  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b SEMATECH   (United States)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^d PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Electron beam lithography; Electron beam resist; High resolution; HSQ; Optical lithography; Spin on glass; X ray lithography

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; PHOTONS; SENSITIVITY ANALYSIS; SPIN GLASS; X RAY LITHOGRAPHY;

HYDROGEN SILESQUIOXANE (HSQ);

PHOTORESISTS;

EID: 0036643762     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00538-5     Document Type: Article

References (4)

1. Abstract EIPBN2001 conference