Supercritical resist drying for isolated nanoline formation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2709-2712

  Namatsu, Hideo ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; DIFFUSION; ELECTRON BEAMS; ETHANOL; NANOTECHNOLOGY; PRESSURE; SCANNING ELECTRON MICROSCOPY; SPIN COATING; SUPERCRITICAL FLUIDS; TEMPERATURE;

HYDROGEN SILSESQUIOXANE; NANOLINES; NEGATIVE TONE RESIST; SUPERCRITICAL RESIST DRYING;

DRYING;

EID: 0035519786     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1418411     Document Type: Article

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