Proton beam writing: A tool for high-aspect ratio mask production

Microsystem Technologies

Volumn 13, Issue 5-6, 2007, Pages 431-434

  Van Kan, J A ^a   Shao, P G ^a   Ansari, K ^a   Bettiol, A A ^a   Osipowicz, T ^a   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTROPLATING; MASKS; NANOTECHNOLOGY; NICKEL; X RAY LITHOGRAPHY; X RAYS;

NANO LITHOGRAPHIC TECHNIQUES; PROTON BEAM WRITING; X-RAY MASKS;

PROTON BEAMS;

EID: 33847330104     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0192-1     Document Type: Article

References (12)

1. Achenbach S (2004) Deep sub micron high aspect ratio polymer structures produced by hard X-ray lithography. Microsyst Technol 10:439-497
2. Ansari K, van Kan JA, Bettiol AA, Watt F (2004) Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing. Appl Phys Lett 85:476-478
3. Biersack J, Haggmark LG (1980) A Monte Carlo computer program for the transport of energetic ions in amorphous targets. Nucl Instr Meth 174:257
4. van Kan JA, Bettiol AA, Watt F (2003a) Three-dimensional nanolithography using proton beam writing. Appl Phys Lett 83:1629-1631
5. van Kan JA, Bettiol AA, Watt F (2003b) Proton beam nanomachining: end station design and testing. Mat Res Soc Symp Proc, vol. 777 T2.1.1
6. van Kan JA, Bettiol AA, Ansari K, Shao PG, Watt F (2004a) Improvement in proton beam writing at the nano scale. In: Proceedings of the IEEE MEMS, pp 673-676
7. van Kan JA, Bettiol AA, Ansari K, Teo EJ, Sum TC, Watt F (2004b) Proton beam writing: a progress review. Int J Nanotechnol 1(4):464-479
8. van Kan JA, Shao PG, Molter P, Saumer M, Bettiol AA, Watt F (2005) Fabrication of a free standing resolution standard for focusing MeV ion beams to sub 30 nm dimensions. Nucl Instr Meth 8231:170-175
9. Menz W, Mohr J, Paul O (2001) Microsystem technology. Wiley-VCH, New York
10. Springham SV, Osipowicz T, Sanchez JL, Gan LH, Watt F (1997) Micromachining using deep ion beam lithography. Nucl Instr Meth 8130:155-159
11. Waligorski MPR, Hamm RN, Katz R (1986) The radial distribution of dose around the path of a heavy ion in liquid water. Nucl Tracks Radiat Meas 11:309-319
12. Watt F, van Kan JA, Rajta I, Bettiol AA, Choo TF, Breese MBH, Osipowicz T (2003) The National University of Singapore high energy ion nano probe facility performance tests. Nucl Instr Meth B210:14-20