Nanometer-period gratings in hydrogen silsesquioxane fabricated by electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages

  Word, Michael J ^a   Adesida, Ilesanmi ^a   Berger, Paul R ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b Ohio State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; DEFECTS; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; HYDROGEN INORGANIC COMPOUNDS; NANOTECHNOLOGY; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON WAFERS; SUBSTRATES; SURFACE ROUGHNESS;

EXPOSURE PROCESSES; GRATING PERIODICITIES; RESOLUTION LIMITS;

THIN FILMS;

EID: 0942278385     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1629711     Document Type: Article

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