Comparison of a new photoresist (DiaPlate 133) with SU-8 using both x-ray and ion beam lithographies

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 4, 2004, Pages 1982-1986

  Gonin, Yvan ^a   Munnik, Frans ^a   Benninger, Frédéric ^a   Dias, Francisco ^b   Mikhaïlov, Sergueï ^a  

^a Ecole d'Ingenieurs de l'Arc Jurassien   (Switzerland)

^b University of Applied Sciences   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAM LITHOGRAPHY; LIGHT SOURCES; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; PHOTONS; RESINS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

COMPLEX STRUCTURES; SYNCHROTRON ACCELERATORS; SYNCHROTRON X-RAY RADIATION; X-RAY SOURCES;

PHOTORESISTS;

EID: 4944228701     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1763896     Document Type: Article

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14. These lengths were calculated using http://cindy.lbl.gov/ optical_constants/atten2.html.
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