Effects of deposition parameters on the structure of AIN coatings grown by reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 3, 2007, Pages 557-565

  Khanna, Atul ^a,b   Bhat, Deepak G ^a  

^a University of Arkansas   (United States)

^b GURU NANAK DEV UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AIN COATING; ALN; ALN COATINGS; ALN FILMS; CRYSTAL SIZE; CUBIC PHASE; DEPOSITION PARAMETERS; DISCHARGE POWER; GLASS SLIDES; GLASS SUBSTRATES; NITROGEN CONCENTRATIONS; PREFERRED ORIENTATIONS; REACTIVE MAGNETRON SPUTTERING; SI SUBSTRATES; SPUTTERING POWER; X-RAY DIFFRACTION STUDIES;

COATINGS; CRYSTAL MICROSTRUCTURE; GLASS; HARDENING; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 42549149479     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2730513     Document Type: Article

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