Crystalline alumina coatings by reactive ac magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 2, 2007, Pages

  Khanna, Atul ^a,b   Bhat, Deepak G ^a  

^a University of Arkansas   (United States)

^b GURU NANAK DEV UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; CRYSTALLINE MATERIALS; FLOW RATE; HYDROGEN; MAGNETRON SPUTTERING; SECONDARY ION MASS SPECTROMETRY; X RAY DIFFRACTION ANALYSIS;

ALUMINA COATINGS; HYDROGEN CONTENT; OXYGEN PARTIAL PRESSURE;

ALUMINA;

EID: 34248598096     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2431353     Document Type: Article

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