Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films

Journal of Applied Physics

Volumn 96, Issue 8, 2004, Pages 4563-4568

  Zhao, Yimin ^a   Zhu, Chunlin ^a   Wang, Sigen ^a   Tian, J Z ^a   Yang, D J ^a   Chen, C K ^a   Cheng, Hao ^b   Hing, Peter ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; HEAT LOSSES; HEAT RESISTANCE; INTERFACES (MATERIALS); REFLECTOMETERS; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SPUTTERING; THERMAL CONDUCTIVITY; THERMODYNAMIC STABILITY;

HEAT ABSORPTION; PHOTOTHERMAL EFFECTS; ROOM TEMPERATURE; SURFACE TEMPERATURE;

THIN FILMS;

EID: 7544231369     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1785850     Document Type: Article

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