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Volumn 24, Issue 5, 2006, Pages 1870-1877
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Growth and characterization of chromium oxide thin films prepared by reactive ac magnetron sputtering
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON OXYGEN PLASMA;
CHROMIUM OXIDES;
DISCHARGE POWER;
GLASS SUBSTRATES;
ALUMINA;
ANNEALING;
CHROMIUM COMPOUNDS;
CRYSTAL ORIENTATION;
CRYSTALS;
FILM GROWTH;
MAGNETRON SPUTTERING;
SCANNING ELECTRON MICROSCOPY;
SECONDARY ION MASS SPECTROMETRY;
SILICON;
SPUTTER DEPOSITION;
X RAY DIFFRACTION;
THIN FILMS;
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EID: 33748615179
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2244536 Document Type: Article |
Times cited : (15)
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References (28)
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