Fabrication of AlN thin films on different substrates at ambient temperature

Superconductor Science and Technology

Volumn 15, Issue 12, 2002, Pages 1781-1783

  Cai, W X ^a   Kang, L ^a   Wu, P H ^a   Yang, S Z ^a   Ji, Z M ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; FABRICATION; MAGNETRON SPUTTERING; MOLECULAR BEAM EPITAXY; PULSED LASER DEPOSITION; SUPERCONDUCTING FILMS; X RAY DIFFRACTION ANALYSIS;

EPITAXIAL FILMS;

THIN FILMS;

EID: 0036917601     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/15/12/333     Document Type: Article

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