A new approach to the deposition of elemental boron and boron-based coatings by pulsed magnetron sputtering of loosely packed boron powder targets

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Audronis, Martynas ^a   Kelly, Peter J ^b   Leyland, Adrian ^a   Matthews, Allan ^a  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

Author keywords

Boron films; Coatings; Loosely packed powder target; Morphology; Physical vapour deposition; Pulsed magnetron sputtering

Indexed keywords

AUTOMOTIVE COMPONENT; BIOMEDICAL IMPLANTS; BORON FILMS; BORON POWDER; CHEMICAL COMPOSITIONS; DEPOSITION PROCESS; LOOSELY PACKED POWDER TARGET; NEW APPROACHES; PACKED POWDER; PHYSICAL VAPOUR DEPOSITION; POTENTIAL APPLICATIONS; PULSED MAGNETRON SPUTTERING; TARGET PREPARATION; THERMOELECTRIC ENERGY; THIN FILM MATERIAL;

BORON; CHEMICAL STABILITY; DEPOSITS; ENERGY CONVERSION; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; MORPHOLOGY; POWDER COATINGS; POWDERS; STEEL POWDER METALLURGY; TARGETS; THERMOELECTRIC ENERGY CONVERSION;

BORON COMPOUNDS;

EID: 39149085743     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730603     Document Type: Conference Paper

References (63)

1. K. Kamimura, T. Yoshimura, T. Nagaoka, M. Nakao, Y. Onuma, M. Makimura, J. Solid State Chem. 2000, 154, 153.
2. H. O. Pierson, A. W. Mullendore, Thin Solid Films 1979, 63, 257.
3. T. Hino, K. Iwamoto, Y. Hirohata, T. Yamashina, A. Sagara, N. Noda, N. Inoue, Y. Kubota, N. Natsir, O. Motojima, Thin Solid Films 1994, 253, 518.
4. C. C. Klepper, R. C. Hazelton, E. J. Yadlowsky, E. P. Carlson, M. D. Keitz, J. M. Williams, R. A. Zuhr, D. B. Poker, J. Vacuum Sci. Technol. A 2002, 20, 725.
5. Y. Tian, A. F. Bastawros, C. C. Lo, A. P. Constant, A. M. Russell, B. A. Cook, Appl. Phys. Lett. 2003, 83, 2781.
6. A. R. Badzian, Appl. Phys. Lett. 1988, 53, 2495.
7. S. M. Gorbatkin, R. L. Rhoades, T. Y. Tsui, W. C. Oliver, Appl. Phys. Lett. 1994, 65, 2672.
8. C. Doughty, S. M. Gorbatkin, T. Y. Tsui, G. M. Pharr, D. L. Medlin, J. Vacuum Sci. Technol. A 1997, 15, 2623.
9. S. Yu, G. Wang, S. Yin, Y. Zhang, Z. Liu, Phys. Lett. A 2000, 268, 442.
10. D. Music, J. M. Schneider, V. Kugler, S. Nakao, P. Jin, M. Ostblom, L. Hultman, U. Helmersson, J. Vacuum Sci. Technol. A 2002, 20, 335.
11. H. E. Duanwei, Y. Zhao, L. Daemen, J. Qian, T. D. Shen, T. W. Zerda, Appl. Phys. Lett. 2002, 81, 643.
12. H. Huang, C. W. Ong, B. Zheng, R. W. M. Kwok, W. M. Lau, J. W. He, J. Vacuum Sci. Technol. A 2003, 21, 1595.
13. P. B. Mirkarimi, K. F. McCarty, D. L. Medlin, Mater. Sci. Eng. R: Reports 1997, 21, 47.
14. F. Richter, G. Krannich, J. Hahn, R. Pintaske, M. Friedrich, S. Schmidbauer, D. R. Zahn, Surf. Coat. Technol. 1997, 90, 178.
15. F. Richter, S. Peter, V. B. Filippov, G. Flemming, M. Kuehn, Int. Symp. Discharg. Electr. Insul. Vac., ISDEIV 1998, 2, 668.
16. F. Richter, G. Flemming, M. Kuhn, S. Peter, H. Wagner, Surf. Coat. Technol. 1999, 112, 43.
17. F. Richter, S. Peter, V. B. Filippov, G. Flemming, M. Kuehn, IEEE Trans. Plasma Sci. 1999, 27, 1079.
18. G. Krannich, F. Richter, J. Hahn, R. Pintaske, V. B. Filippo, Y. Paderno, Diamond Relat. Mater. 1997, 6, 1005.
19. R. R. Ruf, C. C. Tsuei, J. Appl. Phys. 1983, 54, 5705.
20. M. Zhou, Y. Makino, K. Nogi, M. Nose, Thin Solid Films 1999, 343-344, 234.
21. M. Audronis, P. J. Kelly, R. D. Arnell, A. V. Valiulis, Surf. Coat. Technol. 2006, 200, 4166.
22. S. Jayaraman, E. J. Klein, Y. Yang, D. Y. Kim, G. S. Girolami, J. R. Abelson, J. Vacuum Sci. Technol. A 2005, 23, 631.
23. A. S. Dehlinger, J. F. Pierson, A. Roman, P. Bauer, Surf. Coat. Technol. 2003, 174-175, 331.
24. T. Shikama, Y. Sakai, M. Fukutomi, M. Okada, Thin Solid Films 1988, 156, 287.
25. C. Mitterer, J. Solid State Chem. 1997, 133, 279.
26. B. N. Beckloff, W. J. Lackey, J. Am. Ceramic Soc. 1999, 82, 503.
27. C. Pfohl, A. Bulak, K. T. Rie, Surf. Coat. Technol. 2000, 131, 141.
28. M. Berger, M. Larsson, S. Hogmark, Surf. Coat. Technol. 2000, 124, 253.
29. F. Huang, J. A. Barnard, M. L. Weaver, J. Mater. Res. 2001, 16, 945.
30. J. Pelleg, G. Sade, J. Appl. Phys. 2002, 91, 6099.
31. M. Hebbache, L. Stuparević, D. Živković, Solid State Commun. 2006, 139, 227.
32. P. J. Kelly, S. F. Tinston, R. D. Arnell, Surf. Coat. Technol. 1993, 60, 597.
33. P. J. Kelly, S. F. Tinston, Vacuum 1994, 45, 507.
34. S. Ozawa, M. Hamagaki, Vacuum 2004, 74, 417.
35. X. Guo-Ji, W. Yong-Qin, Nucl. Instrum. Methods Phys. Res. A: Accelerators, Spectrometers, Detectors and Associated Equipment 1997, 397, 62.
36. A. Fukukawa, Y. Kato, S. Ishii, Plasma Sources Sci. Technol. 1996, 5, 281.
37. I. Yoshifumi, K. Shunichi, S. Masahiro, N. Masahiro, Jpn. J. Appl. Phys. 1994, 33, 5959.
38. J. M. Williams, C. C. Klepper, R. C. Hazelton, Nucl. Instrum. Methods Phys. Res. B: Beam Interactions with Materials and Atoms 2005, 237, 278.
39. J. M. Williams, C. C. Klepper, R. C. Hazelton, M. D. Keitz, J. E. Lemons, M. Anabtawi, S. Leque, Adv. Mater. Processes 2005, 163, 62
40. A. Matthews, K. S. Fancey, A. S. James, A. Leyland, Surf. Coat. Technol. 1993, 61, 121.
41. N. Satomi, S. Sato, K. Tanaka, M. Saidoh, M. Nishikawa, J. Nucl. Mater. 1995, 220-222, 752.
42. H. Kodama, M. Oyaidzu, M. Sasaki, H. Kimura, Y. Morimoto, Y. Oya, M. Matsuyama, A. Sagara, N. Noda, K. Okuno, J. Nucl. Mater. 2004, 329-333, 889.
43. M. Oyaidzu, A. Yoshikawa, H. Kodama, Y. Oya, A. Sagara, N. Noda, K. Okuno, Appl. Surf. Sci. 2005, 244, 240.
44. T. Takeda, A. Yoshikawa, M. Oyaidzu, T. Nakahata, Y. Nishikawa, H. Kimura, Y. Onishi, H. Miyauchi, Y. Oya, A. Sagara, N. Noda, K. Okuno, Fusion Eng. Des. 2006, 81A, 301.
45. H. Kodama, Y. Morimoto, M. Sasaki, M. Oyaidu, Y. Oya, A. Sagara, N. Noda, K. Okuno, Fusion Sci. Technol. 2003, 44, 420.
46. V. Cholet, R. Herbin, L. Vandenbulcke, Thin Solid Films 1990, 192, 235.
47. J. W. Bradley, H. Backer, Y. Aranda-Gonzalvo, P. J. Kelly, R. D. Arnell, Plasma Sources Sci. Technol. 2002, 11, 165.
48. H. Backer, P. S. Henderson, J. W. Bradley, P. J. Kelly, Surf. Coat. Technol. 2003, 174-175, 909.
49. S. K. Karkari, A. Vetushka, J. W. Bradley, J. Vacuum Sci. Technol. A 2003, 21, L28.
50. A. Vetushka, S. K. Karkari, J. W. Bradley, J. Vacuum Sci. Technol. A 2004, 22, 2459.
51. Y. H. Cheng, H. Kupfer, F. Richter, J. Appl. Phys. 2003, 94, 3624.
52. M. Audronis, P. J. Kelly, R. D. Arnell, A. Leyland, A. Matthews, Surf. Coat. Technol. 2005, 200, 1366.
53. M. Audronis, P. J. Kelly, A. Leyland, A. Matthews, J. Phys.: Conf. Ser. 2006, 26, 355.
54. M. Audronis, P. J. Kelly, A. Leyland, A. Matthews, Thin Solid Films 2006, 515, 1511.
55. M. Audronis, A. Leyland, P. J. Kelly, A. Matthews, Surf. Coat. Technol. 2006, 201, 3970.
56. R. D. Arnell, P. J. Kelly, J. W. Bradley, Surf. Coat. Technol. 2004, 188-189, 158.
57. P. J. Kelly, Y. Zhou, A. Postill, Thin Solid Films 2003, 426, 111.
58. P. J. Kelly, Y. Zhou, J. Hisek, M. Audronis, E. M. Alkoy, Proc. Annu. Tech. Conf. - Soc. Vac. Coat. 2005, 495.
59. M. Audronis, P. J. Kelly, R. D. Arnell, A. Leyland, A. Matthews, Surf. Coat. Technol. 2005, 200, 1616.
60. E. M. Alkoy, P. J. Kelly, Vacuum 2005, 79, 221.
61. D. R. Clarke, Ultramicroscopy 1979, 4, 33.
62. D. R. Askeland, Ed., "The Science and Engineering of Materials", Chapman & Hall, London 1996.
63. J. Ye, H. Oechsner, Thin Solid Films 2006, 514, 138.