SCOPUS 정보 검색 플랫폼

Plasma Sources Science and Technology

Volumn 11, Issue 2, 2002, Pages 165-174

The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge

(5) Bradley, J W a Backer H a Aranda Gonzalvo, Y a Kelly, P J b Arnell, R D b

a UNIVERSITY OF MANCHESTER (United Kingdom)

b UNIVERSITY OF SALFORD (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; MASS SPECTROMETERS; SEMICONDUCTOR PLASMAS; SPECTRUM ANALYSIS; SUBSTRATES; TARGETS; WAVEFORM ANALYSIS;

ENERGY FLUXES;

ION BOMBARDMENT;

EID: 0036576044 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/11/2/307 Document Type: Article

Times cited : (146)

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