메뉴 건너뛰기




Volumn 81 A, Issue 1-4, 2006, Pages 301-306

Helium irradiation effects for deuterium retention in boron coating films

Author keywords

Boron coating film; Deuterium retention; Helium irradiation prior to deuterium; PACVD; TDS

Indexed keywords

BORON; COATINGS; DESORPTION; DEUTERIUM; IRRADIATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

EID: 31844447595     PISSN: 09203796     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.fusengdes.2005.08.049     Document Type: Conference Paper
Times cited : (3)

References (24)
  • 8
    • 0032639712 scopus 로고    scopus 로고
    • Boronization in future devices - Protecting layer against tritium and energetic neutrals
    • N. Noda, K. Tsuzuki, A. Sagara, N. Inoue, and T. Muroga Boronization in future devices - protecting layer against tritium and energetic neutrals J. Nucl. Mater. 266-269 1999 234 239
    • (1999) J. Nucl. Mater. , vol.266-269 , pp. 234-239
    • Noda, N.1    Tsuzuki, K.2    Sagara, A.3    Inoue, N.4    Muroga, T.5
  • 10
    • 24444448126 scopus 로고    scopus 로고
    • Plasma-facing materials mixing and mixed material properties
    • Y. Hirooka Plasma-facing materials mixing and mixed material properties J. Nucl. Mater. 271/272 1999 526 531
    • (1999) J. Nucl. Mater. , vol.271-272 , pp. 526-531
    • Hirooka, Y.1
  • 11
    • 0033721444 scopus 로고    scopus 로고
    • XPS study of the process of oxygen gettering by thin films of PACVD boron
    • M.M. Ennaceur, and B. Terreault XPS study of the process of oxygen gettering by thin films of PACVD boron J. Nucl. Mater. 280 2000 33 38
    • (2000) J. Nucl. Mater. , vol.280 , pp. 33-38
    • Ennaceur, M.M.1    Terreault, B.2
  • 14
    • 0037179780 scopus 로고    scopus 로고
    • First boronization of the TJ-II stellarator
    • D. Tafalla, and F.L. Tabares First boronization of the TJ-II stellarator Vacuum 67 2002 393 397
    • (2002) Vacuum , vol.67 , pp. 393-397
    • Tafalla, D.1    Tabares, F.L.2
  • 17
    • 3342948739 scopus 로고    scopus 로고
    • Implanted hydrogen isotope retention and chemical behavior in boron thin films for wall conditioning
    • Y. Oya, H. Kodama, M. Oyaidzu, Y. Morimoto, M. Matsuyama, and A. Sagara Implanted hydrogen isotope retention and chemical behavior in boron thin films for wall conditioning J. Nucl. Mater. 329-333 2004 870 873
    • (2004) J. Nucl. Mater. , vol.329-333 , pp. 870-873
    • Oya, Y.1    Kodama, H.2    Oyaidzu, M.3    Morimoto, Y.4    Matsuyama, M.5    Sagara, A.6
  • 18
    • 13844321034 scopus 로고    scopus 로고
    • Helium irradiation effects on retention behavior of deuterium implanted into boron coating film by PCVD
    • H. Kodama, M. Oyaidzu, A. Yoshikawa, H. Kimura, Y. Oya, and M. Matsuyama Helium irradiation effects on retention behavior of deuterium implanted into boron coating film by PCVD J. Nucl. Mater. 337-339 2005 649 653
    • (2005) J. Nucl. Mater. , vol.337-339 , pp. 649-653
    • Kodama, H.1    Oyaidzu, M.2    Yoshikawa, A.3    Kimura, H.4    Oya, Y.5    Matsuyama, M.6
  • 20
    • 3342953972 scopus 로고    scopus 로고
    • Studies on structural and chemical characterization for boron coating films deposited by PCVD
    • H. Kodama, M. Oyaidzu, M. Sasaki, H. Kimura, Y. Morimoto, and Y. Oya Studies on structural and chemical characterization for boron coating films deposited by PCVD J. Nucl. Mater. 329-333 2004 889 893
    • (2004) J. Nucl. Mater. , vol.329-333 , pp. 889-893
    • Kodama, H.1    Oyaidzu, M.2    Sasaki, M.3    Kimura, H.4    Morimoto, Y.5    Oya, Y.6
  • 21
    • 0031078688 scopus 로고    scopus 로고
    • Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures
    • A. Annen, R. Beckmann, and W. Jacob Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures J. Non-Cryst. Solids 209 1997 240 246
    • (1997) J. Non-Cryst. Solids , vol.209 , pp. 240-246
    • Annen, A.1    Beckmann, R.2    Jacob, W.3
  • 22
    • 0031145880 scopus 로고    scopus 로고
    • Stability of plasma-deposited amorphous hydrogenated boron films
    • W. Jacob, A. Annen, M. Saß, and R. Beckmann Stability of plasma-deposited amorphous hydrogenated boron films Thin. Solid Films 300 1997 101 106
    • (1997) Thin. Solid Films , vol.300 , pp. 101-106
    • Jacob, W.1    Annen, A.2    Saß, M.3    Beckmann, R.4
  • 24
    • 0002473882 scopus 로고    scopus 로고
    • 32 clusters: Competition between spherical, quasiplanar and tubular isomers
    • 32 clusters: competition between spherical, quasiplanar and tubular isomers Chem. Phys. Lett. 311 1999 21 28
    • (1999) Chem. Phys. Lett. , vol.311 , pp. 21-28
    • Boustani, I.1    Rubio, A.2    Alonso, J.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.