SCOPUS 정보 검색 플랫폼

Volumn 237, Issue 1-2, 2005, Pages 278-283

Ion implantation of boron into silicon by use of the boron cathodic-arc plasma generator: First results

Author keywords

Amorphization; Boron; Cathodic arc; Doping; Shallow junction; Silicon

Indexed keywords

AMORPHIZATION; CATHODES; ETCHING; ION IMPLANTATION; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; SILICON;

CATHODIC ARC; MACROPARTICLES; MOLECULAR RADICALS; SHALLOW JUNCTION;

BORON;

EID: 23444437078 PISSN: 0168583X EISSN: None Source Type: Journal
DOI: 10.1016/j.nimb.2005.05.004 Document Type: Conference Paper

Times cited : (8)

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