Preparation and thermoelectric property of boron thin film

Journal of Solid State Chemistry

Volumn 154, Issue 1, 2000, Pages 153-156

  Kamimura, K ^a   Yoshimura, T ^a   Nagaoka, T ^a   Nakao, M ^a   Onuma, Y ^a   Makimura, M ^b  

^a SHINSHU UNIVERSITY   (Japan)

^b Metallic Material Division   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON DERIVATIVE; SILICON DIOXIDE;

ANALYTIC METHOD; ARTICLE; CONDUCTANCE; FILM; LINEAR SYSTEM; PYROLYSIS; TEMPERATURE;

EID: 0033662613     PISSN: 00224596     EISSN: None     Source Type: Journal    
DOI: 10.1006/jssc.2000.8827     Document Type: Article

References (5)