Pulsed magnetron sputtering of powder targets: A new development tool for multi-component coatings

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 495-500

  Kelly, P J ^a   Zhou, Y ^b   Hisek, J ^b   Audronis, M ^c   Alkoy, E Mensur ^d  

^a MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF SALFORD   (United Kingdom)

^c UNIVERSITY OF SHEFFIELD   (United Kingdom)

^d KOCAELI UNIVERSITY   (Turkey)

Author keywords

Multi component coatings; Powder targets; Pulsed magnetron sputtering; Transparent conductive oxides

Indexed keywords

COATINGS; MAGNETIC FIELDS; OPTIMIZATION; POWDERS; TARGETS;

MULTI-COMPONENT COATINGS; POWDER TARGETS; PULSED MAGNETRON SPUTTERING; TRANSPARENT CONDUCTIVE OXIDES;

MAGNETRON SPUTTERING;

EID: 33644991633     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)

1. M.J. Alam, D.C. Cameron, "Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol-gel process", J. Vac. Sci. Technol., A19(4) 2001, 1642.
2. 2 thin film solar cells", Prog Photovolt. 11 (2003) 225.
3. K.L. Dahm, L.R. Jordan, J. Haase, P.A. Dearnley, "Magnetron sputter deposition of chromium diboride coatings", Surf. Coat. Technol., 108-109 (1998) 413.
4. 2", Nature, 389 (1997), 939.
5. J. Hampshire, P.J. Kelly, D.G. Teer, "The Structure of Co-Deposited Aluminium-Titanium Alloy Coatings," Thin Solid Films, 447-448 (2004) 418.
6. B. Szyszka, "Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering", Thin Solid Films, 351 (1999) 164.
7. O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schope, C. Beneking, H. Wagner, "Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells", Thin Solid Films, 351 (1999) 247.
8. P.J. Kelly, Y. Zhou, A. Postill, "A novel technique for the deposition of transparent conductive oxide films," Thin Solid Films, 426 (2003) 111.
9. Y. Zhou, P.J. Kelly, A. Postill, O. Abu-Zeid, A.A. Alnajjar, "The characteristics of aluminum-doped zinc oxide films prepared by pulsed magnetron sputtering from powder targets," Thin Solid Films, 447-448 (2004) 33-39.
10. J.W. Bradley, H. Bäcker, P.J. Kelly, R.D. Arnell, "Space and time resolved Langmuir probe measurements in a 100kHz pulsed rectangularmagnetron system,"Surf. Coat. Technol. 142-144 (2001) 337.
11. J.W. Bradley, H. Bäcker, Y. Aranda-Gonzalvo, P.J. Kelly, R.D. Arnell, "The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge," Plasma Sources Sci. Technol., 11 (2002) 165.
12. P.J. Kelly, R.D. Arnell, "The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system," Surf. Coat. Technol., 108-109 (1998) 317.
13. Y. Zhou, P.J. Kelly, A. Postill, "The effect of different dopant elements on the properties of films prepared by pulsed magnetron sputtering from powder targets," Proc. 7th Int'l Symp. On Sputtering and Plasma Processes (ISSP 2003), June 2003, Kanazawa, Japan, pp145-148.
14. 2 single crystals using melt-growth techniques," Solar Cells, 16 (1986) 17.
15. P.J. Kelly, J. Hisek, Y. Zhou, R.D. Pilkington and R.D. Arnell, "Advanced coatings through pulsed magnetron sputtering," Surface Engineering, 20, 3 (2004) 157.
16. E. Mensur Alkoy, P.J. Kelly "The Structure and Properties of Copper Oxide and Copper Aluminium Oxide Coatings Prepared by Pulsed Magnetron Sputtering of Powder Targets," In press; submitted to Vacuum (2005).
17. M. Zhou, Y. Makino, K. Nogi, M. Nose, "New Cr-B hard coatings by r.f.-plasma assisted magnetron sputtering method," Thin Solid Films, 343-344 (1999) 234.
18. M. Audronis, P.J. Kelly, R.D. Arnell and A.V. Valiulis, "Pulsed magnetron sputtering of chromium boride films from loose powder targets," Accepted for publication in Surf. Coat. Technol.
19. 2Se," Thin Solid Films, 343-344 (1999) 341.