Chromium diboride thin films by low temperature chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 631-633

  Jayaraman, Sreenivas ^a   Klein, Emily J ^a   Yang, Yu ^a   Kim, Do Young ^a,b   Girolami, Gregory S ^a,b   Abelson, John R ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM DIBORIDE THIN FILMS; DEPTH-WIDTH RATIO; SUBSTRATE TEMPERATURE;

CHEMICAL VAPOR DEPOSITION; ELECTRIC RESISTANCE; NANOSTRUCTURED MATERIALS; STOICHIOMETRY; X RAYS;

CHROMIUM COMPOUNDS;

EID: 31044444995     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1927534     Document Type: Article

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