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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2623-2626

Hard boron-suboxide-based films deposited in a sputter-sourced, high-density plasma deposition system

(5) Doughty, C a,d Gorbatkin, S M a Tsui, T Y b Pharr, G M b Medlin, D L c

a OAK RIDGE NATIONAL LABORATORY (United States)

b RICE UNIVERSITY (United States)

c SANDIA NATIONAL LABORATORIES (United States)

d PlasmaQuest Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031511295 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.580933 Document Type: Article

Times cited : (38)

References (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.