Chemical behaviors of energetic deuterium implanted into boron coatings

Fusion Science and Technology

Volumn 44, Issue 2, 2003, Pages 420-424

  Kodama, H ^a   Morimoto, Y ^a   Sasaki, M ^a   Oyaidu, M ^a   Oya, Y ^b   Sagara, A ^c   Noda, N ^c   Okuno, K ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; FUSION REACTORS; INORGANIC COATINGS; ION IMPLANTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

BORON COATING FILMS; BORON COATINGS; CARBON TRAPPING SITE; THERMAL ADSORPTION SPECTROSCOPY;

DEUTERIUM;

EID: 0041410217     PISSN: 15361055     EISSN: None     Source Type: Journal    
DOI: 10.13182/FST03-A371     Document Type: Article

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