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Volumn 3, Issue 12, 2007, Pages 2076-2080

A chemically amplified fullerene-derivative molecular electron-beam resist

(6) Gibbons, Francis a Zaid, Hasnah M a Manickam, Mayandithevar a Preece, Jon A a Palmer, Richard E a Robinson, Alex P G a

a UNIVERSITY OF BIRMINGHAM (United Kingdom)

Author keywords

Chemical amplification; Electron beams; Fullerenes; Lithography; Resists

Indexed keywords

CROSSLINKING; DERIVATIVES; ELECTRON BEAMS; LITHOGRAPHY; MOLECULAR STRUCTURE;

CHEMICAL AMPLIFICATION; ELECTRON BEAM RESIST;

FULLERENES;

CROSS LINKING REAGENT; FULLERENE DERIVATIVE;

ARTICLE; CHEMISTRY; ELECTRON;

CROSS-LINKING REAGENTS; ELECTRONS; FULLERENES;

EID: 37249029817 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200700324 Document Type: Article

Times cited : (39)

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