Suppression of pinhole defects in fullerene molecular electron beam resists

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1066-1070

  Chen, X ^a,b   Robinson, A P G ^a   Manickam, M ^a   Preece, J A ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

Electron beam lithography; Fullerene; Molecular resist; Pinholes

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFECT DENSITY; ELECTRON BEAM LITHOGRAPHY; OPTICAL RESOLVING POWER; PHOTORESISTS; SPIN COATING; THIN FILMS;

EPOXY CROSSLINKERS; MOLECULAR RESISTS; PINHOLE DENSITY; PINHOLES;

FULLERENES;

EID: 34247571460     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.143     Document Type: Article

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